Hierarchical VLSI Mask Layout Interrogation via Tree Diagram Cross Probing
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Solution Overview
Problem
Current methods for debugging hierarchical interactions in VLSI mask layout designs are time-consuming, error-prone, and cumbersome due to the complexity of hierarchical levels and large layout sizes, making it difficult to identify and compare intermediate mask levels.
Innovation Solution
A method that displays a tree diagram of the layout hierarchy and uses a cross-probing feature to efficiently interrogate mask layout shapes by highlighting their hierarchical locations, allowing for a more accurate and efficient comparison of shape positions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If current debugging methods (opening mask layout, querying individual shapes, reading hierarchical description) are used, then hierarchical interactions can be investigated, but the process is time-consuming and error-prone
Solution Approach 1:
The patent transforms the debugging process from a text-based linear search through hierarchical descriptions to a visual two-dimensional tree diagram representation. This dimensional change allows operators to see the entire hierarchy structure at once, enabling rapid identification of shape locations and hierarchical relationships without manually querying each shape or reading through text descriptions level by level.
Solution Approach 2:
The patent creates a visual copy or representation of the hierarchical structure in the form of a tree diagram, which mirrors the actual mask layout hierarchy. This visual copy allows operators to interrogate and compare shapes by examining their positions in the tree diagram rather than dealing with the complex text-based hierarchical descriptions, significantly reducing debugging time and errors.
2Loss of information
If individual shape querying and text comparison methods are used, then shape hierarchical locations can be identified, but the process is cumbersome and error-prone
Solution Approach 1:
The patent converts the text-based hierarchical location information into a visual tree diagram where hierarchical relationships are represented spatially. This allows operators to easily identify and compare shape locations by visual inspection of the tree structure rather than parsing text descriptions, making the process much easier and less error-prone.
Solution Approach 2:
The patent uses visual highlighting and color coding in the tree diagram to indicate selected shapes and their hierarchical relationships. This visual differentiation makes it easy to distinguish between different shapes and their locations in the hierarchy, improving ease of operation compared to text-based methods where no such visual cues are available.
3Area of stationary object
If the entire mask layout is displayed without hierarchical organization, then all shapes are visible, but the complexity and size make it difficult to find specific shapes
Solution Approach 1:
The patent segments the entire mask layout into a hierarchical tree structure, organizing shapes by their hierarchical relationships. This segmentation allows the complete layout to be displayed in an organized manner where each node in the tree represents a shape or group of shapes, making it easy to locate specific shapes without being overwhelmed by the overall complexity and size of the full layout.
Solution Approach 2:
The patent transforms the flat, two-dimensional mask layout into a three-dimensional hierarchical tree structure that visually represents the hierarchical relationships. This dimensional transformation allows operators to navigate and detect shape locations more easily by following the tree structure rather than searching through the entire layout, solving the problem of finding specific shapes in large complex designs.
Data Source
AI summary
The present disclosure is directed to a method for hierarchical Very Large Scale Integrated (VLSI) mask layout data interrogation. The method displays a tree diagram of the layout hierarchy and then allows the user to interrogate the mask layout shapes by using a cross probing feature.