Voltage Contrast Defect Detection via Targeted ROI Segmentation
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Solution Overview
Problem
Current defect detection systems in semiconductor wafers face challenges in efficiently identifying and classifying defects across vast numbers of data points while maintaining resolution and capacity, particularly in inferring root causes without sacrificing speed or accuracy.
Innovation Solution
A voltage contrast imaging defect detection system that utilizes a particle beam source, detector, and controller to generate metrics, determine target areas, and detect defects based on voltage contrast imaging datasets, focusing on specific areas of interest to enhance throughput and accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If inspection systems analyze vast numbers of data points across hundreds of chips with thousands of components each, then defect detection coverage is improved, but inspection speed and processing time deteriorate
Solution Approach 1:
The patent divides the chip into multiple regions of interest (ROIs) based on defect probability assessments. Instead of uniformly inspecting all areas, the system segments the inspection task into high-priority ROIs where defects are more likely to occur and low-priority areas that can be inspected with reduced scrutiny or skipped entirely. This segmentation enables the system to maintain high defect detection coverage in critical areas while significantly reducing overall inspection time.
Solution Approach 2:
The system applies different inspection qualities and resolutions to different regions of the chip based on their defect probability. High-defect-probability regions receive full-resolution, thorough inspection, while low-defect-probability regions receive reduced inspection. This local quality approach ensures that inspection resources are concentrated where they are most needed, improving both detection coverage and speed simultaneously.
2Measurement precision
If inspection systems increase resolution and capacity to infer root causes of defects, then diagnostic accuracy is improved, but inspection speed and throughput deteriorate
Solution Approach 1:
The system performs preliminary defect probability assessment and ROI identification before conducting detailed defect analysis. By pre-processing the data to identify where defects are most likely to occur and what types of defects to expect, the system prepares targeted inspection parameters in advance. This preliminary action enables subsequent high-resolution root cause analysis to be performed quickly and accurately only in the identified ROIs, rather than conducting exhaustive analysis across the entire chip.
Solution Approach 2:
The system applies partial action by performing complete defect analysis only in regions where defects are highly probable, rather than applying full analysis uniformly across all chip areas. The defect probability assessment allows the system to concentrate its analytical resources partially on specific ROIs, achieving high diagnostic accuracy where needed while maintaining overall inspection throughput.
3Measurement precision
If voltage contrast imaging is applied to entire chip surfaces, then defect detection completeness is improved, but processing time and computational resources deteriorate
Solution Approach 1:
The patent extracts and isolates only the regions of the chip where defects are most likely to occur, based on defect probability assessments considering design characteristics, manufacturing variability, and historical data. By taking out these specific ROIs from the full chip dataset, the system performs voltage contrast imaging only on the extracted regions of interest, achieving complete defect detection within those critical areas while dramatically reducing the total processing time and computational resources required compared to inspecting the entire chip surface.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for targeted defect detection with improved accuracy and reduced false positives, increasing actionable data and diagnostic resolution, particularly for structures with predictable VCI signals, thereby addressing the limitations of existing systems.
Implementation Method 1
A voltage contrast imaging defect detection apparatus is disclosed, in accordance with one or more illustrative embodiments of the present disclosure. In one illustrative embodiment, the apparatus includes a particle beam source configured to generate one or more particle beams.
Data Source
AI summary
A voltage contrast imaging defect detection system includes a voltage contrast imaging tool and a controller coupled to the voltage contrast imaging tool. The controller is configured to generate one or more voltage contrast imaging metrics for one or more structures on a sample, determine one or more target areas on the sample based on the one or more voltage contrast imaging metrics, receive a voltage contrast imaging dataset for the one or more target areas on the sample from the voltage contrast imaging tool, and detect one or more defects based on the voltage contrast imaging dataset.


