Vortex Flow Meter for Semiconductor Fluid Monitoring
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Solution Overview
Problem
Semiconductor fabrication tools face temperature control issues due to improper fluid flow rates in heating or cooling loops, leading to misprocessing of substrates and mechanical failures, necessitating effective flow monitoring systems.
Innovation Solution
A low-resistance vortex flow meter system with no moving parts, using a bluff body to create vortices and a piezoelectric sensor to measure flow rates, coupled with a digital readout and trip point settings, which sends electrical signals to the manufacturing apparatus or computer for remote control and monitoring.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional flow monitoring systems are used, then flow rates can be monitored, but the systems add complexity and potential failure points to the temperature control system
Solution Approach 1:
The patent extracts the flow monitoring function from complex traditional flow meters and implements it through a simplified acoustic measurement system that uses sound wave propagation characteristics to determine flow rates, eliminating the need for mechanical moving parts and complex sensor assemblies
Solution Approach 2:
The patent replaces mechanical flow measurement systems with an acoustic field-based measurement system that uses ultrasonic waves to non-invasively measure fluid flow characteristics, thereby eliminating mechanical wear and failure points
2Measurement precision
If acoustic wave measurement is used to measure fluid flow, then non-intrusive measurement is achieved, but the acoustic waves may be affected by fluid properties and flow conditions
Solution Approach 1:
The system incorporates feedback mechanisms where the acoustic transducers continuously monitor the acoustic properties of the fluid and adjust measurements based on detected changes in fluid composition, temperature, or flow conditions, compensating for interfering factors in real-time
Solution Approach 2:
The patent utilizes changes in acoustic wave parameters (velocity, frequency, attenuation) in response to fluid flow conditions and transforms these parameter changes into accurate flow rate measurements, turning the effect of fluid properties into a useful measurement signal
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system provides accurate and reliable fluid flow monitoring, preventing temperature extremes and mechanical failures by automatically adjusting fluid flow rates, ensuring precise temperature control and substrate processing.
Implementation Method 1
a piezoelectric sensor to measure flow rates
Implementation Method 2
using a bluff body to create vortices
Data Source
AI summary
A system and method provide for monitoring and controlling fluid flow in semiconductor manufacturing apparatuses. The method and system include a vortex flow meter coupled to a digital readout that displays the measured flow rate and trip point. The flow meter display includes input devices used to adjust the trip point. The system and method provide for sending signals via a custom relay to the semiconductor manufacturing apparatus which is adapted to terminate a processing operation or change the fluid flow if the trip point is tripped. The system and method also provide for sending an electrical signal to a computer by way of a data acquisition unit and a converter. The converter converts the signal to a communication protocol consistent with the computer network and provides fluid flow information and trip point data as a function of time to the computer which then displays such data graphically.