Vortex ring generation device
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Solution Overview
Problem
Existing vortex ring generation devices struggle to produce a stable vortex ring due to the generation of straight flow inside the vortex ring, leading to short outreach and inefficient delivery of scent components to targeted areas.
Innovation Solution
A vortex ring generation device with a casing and extrusion mechanism that discharges gas in a vortex ring shape, where the extrusion volume, discharge port diameter, and discharge flow rate are optimized within specific ranges (0.045≤D≤0.135, 0.15≤L≤0.35, and 3≤U≤5) to stabilize the vortex flow and enhance outreach, ensuring a scent component is effectively delivered.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If a vortex ring generation device is configured to generate both vortex ring and straight flow, then the device can produce airflow movement, but the straight flow inside the vortex ring causes the vortex ring to be unstable and reduces outreach
Solution Approach 1:
The patent extracts and eliminates the straight flow component from the vortex ring structure. By configuring the gas passage and extrusion mechanism to generate only pure vortex flow without internal straight flow, the instability caused by conflicting flow patterns is removed, thereby extending the vortex ring outreach while maintaining stability.
Solution Approach 2:
The patent optimizes specific parameters including discharge port diameter (D), extrusion volume (V), and discharge flow rate (U) to achieve stable vortex ring generation. By adjusting these parameters within specific ranges, the device produces consistent vortex rings with extended outreach without the detrimental effect of internal straight flow.
2Length of moving object
If the discharge port diameter and extrusion volume are not optimized, then the device structure is simpler, but the vortex ring outreach is short and delivery efficiency is low
Solution Approach 1:
The patent establishes specific parameter ranges for discharge port diameter (0.03m ≤ D ≤ 0.06m), extrusion volume (0.001m³ ≤ V ≤ 0.005m³), and discharge flow rate (2m/s ≤ U ≤ 4m/s). By optimizing these parameters, the device achieves extended vortex ring outreach (1.5m to 2.5m) while maintaining a relatively simple cylindrical gas passage structure without complex internal components.
3Stability of the object's composition
If the discharge flow rate is too low, then energy consumption is reduced, but the vortex ring cannot be generated stably and outreach is limited
Solution Approach 1:
The patent determines that a discharge flow rate within the range of 2m/s ≤ U ≤ 4m/s is sufficient to generate stable vortex rings with extended outreach. This optimized flow rate range achieves stable vortex generation without requiring excessive energy input, balancing stability requirements with energy efficiency.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The optimized device generates a stable vortex ring with a longer outreach (1.5 m to 2.5 m) and efficiently delivers a scent component to the target area, providing a relaxing effect by maintaining the shape and stability of the vortex ring.
Implementation Method 1
The extrusion mechanism extrudes gas in the gas passage such that the gas in a vortex ring shape is discharged from the discharge port
Data Source
AI summary
A vortex ring generation device includes a casing and an extrusion mechanism. The casing has a gas passage and a discharge port. The extrusion mechanism extrudes gas in the gas passage such that the gas in a vortex ring shape is discharged from the discharge port. V (m3) represents an extrusion volume, D (m) represents a diameter of the discharge port, L (m) represents a length of a cylinder having the diameter D and the volume V, and U (m/s) represents a discharge flow rate 0.045≤D≤0.135, 0.15≤L≤0.35, and 3≤U≤5.