Vacuum Ultraviolet Exposure Device Oxygen Threshold Control
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Solution Overview
Problem
The efficiency of exposure processing for substrates in photolithography using vacuum ultraviolet rays is hindered by the presence of oxygen, which attenuates the rays and requires a lengthy process to reduce oxygen concentration below 1% in the exposure device, thereby prolonging processing time.
Innovation Solution
An exposure device with a processing chamber, oxygen concentration meter, illuminometer, and light source controller that starts emitting vacuum ultraviolet rays when oxygen concentration reaches a predetermined level above 1%, allowing exposure before the chamber reaches 1% oxygen, and stops when the desired exposure amount is achieved, along with an optional inert gas supplier to further reduce oxygen concentration quickly.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If oxygen concentration is reduced to 1% or lower before exposure processing, then ozone generation is prevented and film damage is avoided, but processing time is significantly prolonged
Solution Approach 1:
The patent changes the oxygen concentration parameter threshold from 1% to a higher level (1%-20%), enabling exposure processing to start earlier while still preventing film damage through controlled ozone generation levels
Solution Approach 2:
The patent allows partial ozone generation (excessive oxygen concentration relative to traditional methods) by setting the threshold at 1%-20%, accepting some ozone generation as long as it remains below the level that causes film damage, thereby reducing processing time
2Illumination intensity
If gas discharge is continued until oxygen concentration reaches 1%, then vacuum ultraviolet ray attenuation is minimized, but processing efficiency is reduced due to lengthy preparation time
Solution Approach 1:
The patent changes the oxygen concentration threshold parameter from 1% to a higher range (1%-20%), allowing exposure to begin earlier when vacuum ultraviolet ray intensity is still sufficient, thereby improving processing efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces the time required for exposure processing by initiating exposure before the oxygen concentration reaches 1%, minimizing ozone generation that could damage the substrate, and enhancing processing efficiency by using inert gases to rapidly lower oxygen levels.
Implementation Method 1
when oxygen is present in the paths of the vacuum ultraviolet rays emitted to the substrate, oxygen molecules that receive the vacuum ultraviolet rays are separated into oxygen atoms
Implementation Method 2
oxygen molecules that receive the vacuum ultraviolet rays are separated into oxygen atoms, and the separated oxygen atoms are recoupled with other oxygen molecules. Thus, ozone is generated
Implementation Method 3
heating processing is performed on the substrate to which a block polymer has been applied, and then one surface of the substrate is exposed. Thus, the block polymer is reformed
Data Source
AI summary
An atmosphere in a processing chamber in which a substrate is stored is discharged by a suction device. At a time point at which oxygen concentration in the processing chamber is lowered to predetermined exposure starting concentration, emission of vacuum ultraviolet rays from a light source to the substrate is started. The emission of the vacuum ultraviolet rays to the substrate is stopped at a time point at which the exposure amount of the substrate increases to a predetermined set exposure amount. The exposure starting concentration is defined in advance to be higher than 1% and lower than oxygen concentration in the air, and is defined in advance such that ozone generated from oxygen atoms by the emission of the vacuum ultraviolet rays do not damage the film on the surface to be processed of the substrate.