Wafer Adaptor Ring Assembly for Multi-Size Plasma Dicing

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Solution Overview

Problem

The high cost and long lead time associated with purchasing separate plasma chambers for different wafer sizes in semiconductor processing, as well as the inefficiencies of mechanical sawing which can cause cracking and slow throughput, necessitate a solution for adapting wafers of varying sizes within existing plasma processing systems.

Innovation Solution

The development of wafer adaptors comprising a primary ring and an adaptor ring with an adhesive sheet, allowing for the secure mounting and processing of different sized wafers within a single plasma etch chamber, thereby eliminating the need for multiple plasma chambers and reducing the risk of cracking.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Adaptability or versatility

If a plasma chamber is purchased for each wafer size, then processing capability for specific wafer size is ensured, but cost and lead time increase significantly

Engineering Contradiction:
Improvewafer size compatibilityVSAvoidnumber of plasma chambers
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The plasma chamber is designed to process multiple wafer sizes (e.g., 200mm and 300mm) through the use of interchangeable adapter rings. The adapter rings allow the same plasma chamber to accommodate different wafer dimensions, eliminating the need for separate dedicated chambers for each wafer size and reducing overall system complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

Smaller adapter rings are nested within the plasma chamber, allowing smaller wafers to be processed in a chamber designed for larger wafers. The adapter rings fit concentrically within the chamber, creating a nested configuration that enables multi-size compatibility without requiring separate chambers.

Inventive Principle:
Principle #7Nested doll (Nesting)

2Productivity

If mechanical sawing is used for dicing, then separation of dies is achieved, but processing time increases and cracking may occur

Engineering Contradiction:
Improvedicing throughputVSAvoidwafer cracking
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The mechanical sawing process is replaced with plasma etching for dicing. Instead of using mechanical blades to cut the wafer, plasma is used to etch and separate the dies. This substitution eliminates mechanical contact and vibration that cause cracking, while significantly improving dicing throughput and efficiency.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Adaptability or versatility

If adapter ring is added to accommodate smaller wafers, then wafer size adaptability is improved, but device complexity increases

Engineering Contradiction:
Improvewafer size accommodationVSAvoidadapter ring assembly
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The system is segmented into modular components: the plasma chamber, adapter rings, and wafer holders. Each adapter ring is a separate, interchangeable component that can be quickly swapped depending on the wafer size required. This segmentation allows for easy adaptation without permanently modifying the plasma chamber structure.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enables cost savings by allowing the use of existing plasma chambers for various wafer sizes, improving processing throughput, and reducing the likelihood of wafer cracking, while maintaining the efficiency of plasma dicing.

Implementation Method 1

The ring assembly also includes an adhesive sheet. The adhesive sheet is attached to a bottom adaptor ring surface and is disposed in the adaptor ring opening.

Methodology Applied
Scientific EffectAdhesion: Adhesive

Implementation Method 2

Plasma dicing entails mounting a wafer onto a wafer ring and inserting the wafer ring with the wafer into a plasma chamber for etching.

Methodology Applied
Scientific EffectPlasma etching: Plasma

Data Source

PatentUS12165921B2Wafer adaptor for adapting different sized wafers
Publication Date: 2024.12.10 UTAC HEADQUARTERS PTE LTD
  • US12165921B2 patent drawing
  • US12165921B2 patent drawing
  • US12165921B2 patent drawing

AI summary

A wafer adaptor ring assembly for adapting an adapted sized wafer for plasma dicing by a plasma etch chamber designed for dicing a designed sized wafer, which is larger than the adapted sized wafer is disclosed. The wafer adaptor ring assembly includes a primary wafer ring designed for plasma dicing the designed sized wafer by the plasma, an adhesive sheet attached to a bottom surface of the primary wafer ring, and an adapted sized wafer disposed on the adhesive sheet between the primary wafer ring and the adapted sized wafer. A method for forming the wafer adaptor ring assembly is also disclosed.