Wafer Alignment via Image Projection Refinement

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Solution Overview

Problem

Patch-to-design alignment (PDA) in semiconductor manufacturing is negatively impacted by process variations, leading to poor alignment accuracy, especially in low-contrast images or images difficult to align, which can result in incorrect processing decisions and reduced yield.

Innovation Solution

The method involves aligning setup and runtime images using a processor to determine normalized cross-correlation scores and image projections in perpendicular directions, adjusting the images to overlap peak locations, and determining offsets for accurate placement of care areas, thereby improving alignment stability and accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional patch-to-design alignment is used, then the alignment process is simple, but alignment accuracy deteriorates due to process variation and low image contrast

Engineering Contradiction:
Improvealignment accuracyVSAvoidalignment process complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The alignment process is segmented into multiple stages: initial patch-to-design alignment, normalized cross-correlation scoring, and conditional projection-based refinement. This segmentation allows the system to apply complex processing only when needed (when NCC score is below threshold), thereby improving alignment accuracy while controlling overall process complexity.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent performs preliminary alignment using traditional PDA methods to establish an initial alignment state before evaluating image quality metrics. This preliminary action provides a baseline that enables subsequent conditional refinement only when necessary, balancing simplicity and accuracy.

Inventive Principle:
Principle #10Preliminary action

2Measurement precision

If image projection alignment is always applied, then alignment accuracy improves, but processing time increases

Engineering Contradiction:
Improvealignment accuracyVSAvoidprocessing time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent applies projection-based alignment partially - only when the normalized cross-correlation score falls below a predetermined threshold. This partial application of the alignment refinement process avoids unnecessary processing time for images that already have good contrast and alignment quality, while still improving accuracy for challenging cases.

Inventive Principle:
Principle #16Partial or excessive action

Solution Approach 2:

The alignment process is made dynamic by conditionally adjusting the processing path based on image quality assessment. The system adapts its complexity in real-time, applying full projection-based refinement only when image characteristics warrant it, thereby optimizing the balance between accuracy and processing time.

Inventive Principle:
Principle #15Dynamics

3Productivity

If traditional alignment methods are used, then processing speed is maintained, but alignment stability deteriorates leading to target failure

Engineering Contradiction:
Improveprocessing speedVSAvoidalignment stability
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The patent implements feedback through normalized cross-correlation scoring to assess alignment quality. This feedback mechanism identifies cases where traditional alignment has failed or is insufficient, triggering projection-based refinement only when needed. This maintains high processing speed for good cases while improving reliability for problematic cases.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent replaces purely mechanical/image-based alignment with a hybrid approach that incorporates signal processing techniques (projection and correlation analysis). This substitution enhances alignment stability by using mathematical transformations that are more robust to process variation and low contrast conditions.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

4Measurement precision

If projection-based alignment refinement is applied, then alignment accuracy improves for low-contrast images, but computational complexity increases

Engineering Contradiction:
Improvealignment accuracyVSAvoidcomputational complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent applies computationally intensive projection-based alignment refinement only partially - specifically when the normalized cross-correlation score indicates poor image quality. This selective application reduces overall computational complexity while maintaining high alignment accuracy for the subset of images that need it.

Inventive Principle:
Principle #16Partial or excessive action

Solution Approach 2:

The computational process is segmented into a fast initial alignment stage and a conditional refinement stage. This segmentation allows the system to maintain low computational complexity for most cases while providing high accuracy refinement when image quality metrics indicate it is necessary.

Inventive Principle:
Principle #1Segmentation

Data Source

PatentUS20230075297A1Wafer alignment improvement through image projection-based patch-to-design alignment
Publication Date: 2023.03.09 KLA CORP
  • US20230075297A1 patent drawing
  • US20230075297A1 patent drawing
  • US20230075297A1 patent drawing

AI summary

Image alignment or image-to-design alignment can be improved using normalized cross-correlation. A setup image to a runtime image are aligned and a normalized cross-correlation scores is determined. Image projections for the images can be determined and aligned in the perpendicular x and y directions. Alignment of the image projections can include finding projection peak locations and adjusting the projection peak locations in the x and y directions.