Wafer Boat Cooling Wall With High Heat Absorptance

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Solution Overview

Problem

Wafer boat handling devices under vertical batch furnaces face inefficiencies in cooling due to high heat radiation surface absorptance of walls, which reflects heat rather than absorbing it, leading to slower cooling of wafer boats and processed wafers.

Innovation Solution

A wafer boat handling device with a wall part adjacent the cooldown position having a heat radiation surface absorptance of at least 0.6 to effectively absorb heat radiation, combined with a gas circulation system for enhanced cooling, utilizing a metal or anodized aluminum wall with a heat sink and cooling channels to manage heat absorption and dissipation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-generated harmful factors

If a stainless steel wall with heat radiation surface absorptance of 0.3-0.4 is used, then the wall reflects heat away from the wafer boat, but this results in slower cooling of the wafer boat

Engineering Contradiction:
Improveheat reflectionVSAvoidcooling time
Core Design Contradiction:
Object-generated harmful factorsVSLoss of time

Solution Approach 1:

The invention changes the heat radiation surface absorptance parameter of the wall from 0.3-0.4 (stainless steel) to at least 0.60 (black anodized aluminum or black painted metal), fundamentally altering the thermal radiation characteristics to improve cooling efficiency

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention applies black anodization or black paint coating to the wall surface, changing its color and corresponding thermal radiation properties. The black surface has higher absorptance (≥0.60) compared to stainless steel (0.3-0.4), enabling more effective heat absorption from the wafer boat

Inventive Principle:
Principle #32Color changes

2Temperature

If the wall absorptance is increased to at least 0.60, then heat radiation is absorbed more effectively, but this requires special coating or material treatment

Engineering Contradiction:
Improvecooling efficiencyVSAvoidwall treatment complexity
Core Design Contradiction:
TemperatureVSEase of manufacture

Solution Approach 1:

The invention uses black anodization or black paint coating on standard metal walls to achieve high absorptance (≥0.60). These are conventional surface treatment techniques that are relatively easy to apply to metal walls, making the solution practical for manufacturing

Inventive Principle:
Principle #32Color changes

Solution Approach 2:

The invention creates a composite structure by applying a black coating layer (anodization or paint) on top of a metal wall, combining the structural properties of metal with the high absorptance properties of the black surface layer

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution significantly reduces the cooling time of wafer boats from 300 to 800 degrees Celsius to 25 to 100 degrees Celsius, allowing for quicker retrieval of processed wafers and improved operational efficiency of the handling device.

Implementation Method 1

A part of the wall adjacent the cool down position may be a wall part having a heat radiation surface absorptance of at least 0.60 so as to absorb heat from the wafer boat which is in the cooldown position by means of heat radiation absorption

Methodology Applied
Scientific EffectHeat radiation absorption: Absorption (EM radiation)

Implementation Method 2

In wafer boat handling devices, this cooling may be improved by a circulation of air or gas which may be cooled by using a heat-exchanger

Methodology Applied
Scientific EffectConvection: Convection

Data Source

PatentUS11996309B2Wafer boat handling device, vertical batch furnace and method
Publication Date: 2024.05.28 ASM IP HLDG BV
  • US11996309B2 patent drawing
  • US11996309B2 patent drawing

AI summary

A wafer boat handling device, configured to be positioned under a process chamber of a vertical batch furnace. The wafer boat handling device comprises a main housing having a wall defining and bounding a wafer boat handling space, and a boat transporter comprising a wafer boat support for supporting a wafer boat and configured to transport the wafer boat to a cooldown position within the wafer boat handling space. A part of the wall adjacent the cooldown position is a wall part with a heat radiation surface absorptance of at least 0.60 so as to withdraw heat from the wafer boat which is in the cooldown position by means of heat radiation absorption.