Wafer Transfer Bypass Layout Using Overlapping Multi-Height Paths

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Solution Overview

Problem

Existing substrate processing systems face inefficiencies in transferring wafers between processing modules, particularly in bypassing non-processing modules, leading to increased complexity and potential interference with main transfer mechanisms.

Innovation Solution

A substrate processing apparatus with bypass transfer mechanisms that have varying heights and partially overlapping transfer paths, allowing wafers to be transferred efficiently between processing blocks without passing through processing modules, using shuttles that bypass the main transfer mechanisms.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If bypass transfer mechanisms are added to transfer wafers without passing through processing modules, then transfer efficiency is improved, but device complexity increases

Engineering Contradiction:
Improvetransfer efficiencyVSAvoidsystem complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The bypass transfer mechanisms are positioned at different heights (vertical dimension) than the main transfer mechanisms. Specifically, when the main transfer mechanism is at a first height, the bypass transfer mechanism is at a second height that is higher than the first height. This vertical separation allows bypass transfers to occur in three-dimensional space without interfering with the horizontal plane operations of the main transfer mechanism, thereby improving transfer efficiency while managing system complexity through spatial organization.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Area of stationary object

If bypass transfer paths overlap in plan view, then space utilization is improved, but interference between transfer paths may occur

Engineering Contradiction:
Improvespace utilizationVSAvoidtransfer path interference
Core Design Contradiction:
Area of stationary objectVSReliability

Solution Approach 1:

The invention resolves potential interference between overlapping bypass transfer paths by utilizing the vertical dimension. Multiple bypass transfer mechanisms can have their transfer paths overlap when viewed in plan view, but they operate at different heights (first height, second height, third height). This vertical stratification allows the paths to coexist in three-dimensional space without physical interference, maximizing space utilization while maintaining operational reliability.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Adaptability or versatility

If multiple bypass transfer mechanisms are provided at different heights, then transfer path flexibility is improved, but manufacturing complexity increases

Engineering Contradiction:
Improvetransfer path flexibilityVSAvoidmanufacturing complexity
Core Design Contradiction:
Adaptability or versatilityVSEase of manufacture

Solution Approach 1:

The substrate processing apparatus is divided into multiple vertically stacked processing blocks, each containing processing modules at different heights. The bypass transfer mechanisms are similarly segmented and positioned at corresponding heights within these blocks. This segmentation allows each bypass transfer mechanism to serve specific processing blocks at its height level, providing transfer path flexibility while enabling modular manufacturing and assembly of the overall system.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The invention implements bypass transfer mechanisms at multiple vertical levels (first height, second height, third height) to create a three-dimensional transfer network. This vertical arrangement provides flexible routing options for wafer transfers, allowing the system to adapt to different processing configurations. The modular vertical stacking approach facilitates standardized manufacturing of each level while maintaining overall system flexibility.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentUS20250349586A1Substrate processing apparatus and substrate processing method
Publication Date: 2025.11.13 TOKYO ELECTRON LTD
  • US20250349586A1 patent drawing
  • US20250349586A1 patent drawing
  • US20250349586A1 patent drawing

AI summary

A substrate processing apparatus includes: a loading/unloading block; a processing station provided on one of left and right sides of the loading/unloading block; a relay block provided on one of left and right sides of the processing station; processing blocks provided side by side in a left-right direction to form the processing station, each of the processing blocks including a processing module configured to perform a process on the substrate and a main transfer mechanism configured to deliver the substrate to the processing module; and bypass transfer mechanisms provided separately from the main transfer mechanism and provided respectively for the processing blocks arranged side by side in the left-right direction to transfer the substrate between left and right blocks, wherein bypass transfer paths for the substrate transferred by the plurality of bypass transfer mechanisms have heights different from each other, and partially overlap each other in a plan view.