Ventilated Wafer Cassette With Dustproof Labyrinth Venting
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Solution Overview
Problem
Existing wafer cassettes in the semiconductor industry suffer from poor gas exchange between the interior and exterior, leading to deformation during vacuuming and inflation processes due to inadequate pressure equalization.
Innovation Solution
A ventilated wafer cassette design featuring at least one ventilation channel connecting the hollow structure to the external environment, equipped with a dustproof labyrinth structure to facilitate gas flow while preventing dust entry, ensuring effective gas exchange and preventing deformation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the upper box is tightly fitted on the lower box to form a sealed structure, then the sealing performance is improved, but the gas exchange between interior and exterior deteriorates
Solution Approach 1:
The ventilation channel is segmented into multiple sections including a ventilation hole, a ventilation groove, and a dustproof labyrinth structure. This segmentation allows the system to simultaneously achieve gas exchange functionality and dustproof performance, resolving the contradiction between sealed structure and gas exchange efficiency.
Solution Approach 2:
The dustproof labyrinth structure is designed with specific local geometry (protrusions creating tortuous paths) at the ventilation channel location. This local structural modification enables selective passage of gas while blocking dust particles, maintaining both sealing performance and gas exchange efficiency.
2Productivity
If the ventilation channel allows free gas flow, then the gas exchange efficiency is improved, but the dustproof performance deteriorates
Solution Approach 1:
The dustproof labyrinth structure acts as an intermediary element within the ventilation channel. It mediates between the need for gas flow and dust prevention by creating a tortuous path that allows gas molecules to pass while trapping larger dust particles through multiple direction changes and narrow passages.
Solution Approach 2:
The ventilation channel incorporates a porous-like labyrinthine structure with multiple narrow passages and protrusions. This structure provides sufficient open area for gas exchange while the complex geometry acts as a physical filter to prevent dust entry.
3Reliability
If the wafer cassette is vacuumed without ventilation, then the vacuum sealing is improved, but the deformation during pressure change deteriorates
Solution Approach 1:
The ventilation channel is pre-designed and integrated into the wafer cassette structure before vacuuming operations. This preliminary provision of pressure equalization pathways prevents sudden pressure differential-induced deformation during vacuuming and inflation processes, while maintaining vacuum sealing capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The ventilated wafer cassette enables efficient gas exchange, preventing deformation and enhancing dustproof performance, thus addressing the limitations of prior art designs.
Implementation Method 1
the continuously varying inner diameter dimension causes a continuous change of the flow rate of the gas, so that the dust settles at a section which has larger inner diameter and slower flow rate
Implementation Method 2
the continuously varying inner diameter dimension causes a continuous change of the flow rate of the gas
Data Source
AI summary
A ventilated wafer cassette is provided. The cassette comprises an upper box, a lower box, and an inner box, wherein the upper box is fitted on the lower box to form a hollow structure, in which the inner box is disposed. At least one ventilation channel connecting the hollow structure with an external environment is provided in the upper box, in the lower box or at the connection between the upper box and the lower box. The ventilated wafer cassette of the present application can ensure gas exchange during the gas protection process conducted on semiconductor wafers, thereby preventing deformation of the wafer cassette due to pressure differences. Preferably, the interior of the ventilation channel is provided with a dustproof labyrinth structure, thereby preventing the entry of dust.