Segmented Wafer Storage Chamber for Targeted Purge Gas Flow
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Solution Overview
Problem
Existing wafer storage containers suffer from vertical gas flow that contaminates clean wafers and waste gas due to injection into unoccupied areas, leading to inefficiency and increased contamination risk.
Innovation Solution
The storage chamber is divided into multiple regions by blocking plates, with dedicated injection and exhaust holes for each region, restricting vertical gas flow and optimizing gas usage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If gas is injected into the storage chamber without dividing it into regions, then the structure is simple, but fumes from contaminated wafers flow vertically to other wafers increasing contamination
Solution Approach 1:
The storage chamber is divided into multiple storage regions by blocking plates that extend vertically between support plates. Each storage region contains one or more wafers and has dedicated injection and exhaust holes, preventing vertical cross-contamination of fumes between regions while maintaining separate gas flow paths for each region.
2Loss of substance
If gas is injected into the entire storage chamber, then all areas are covered, but gas is wasted in areas where no wafers are present
Solution Approach 1:
Each storage region is equipped with dedicated injection holes and exhaust holes tailored to its specific needs. The injection holes are positioned to direct purge gas onto wafers within that specific region, and exhaust holes are positioned to remove fumes from the same region, ensuring gas is only consumed where wafers are present and purging is actually needed.
3Loss of energy
If blocking plates are added to divide the storage chamber, then gas flow control is improved and waste is reduced, but the device becomes more complex
Solution Approach 1:
Blocking plates are positioned between support plates to divide the storage chamber into multiple storage regions. Each blocking plate creates physical separation that restricts vertical gas flow, and the structure integrates with existing support plates to form a modular system that reduces gas waste without requiring complete redesign of the storage chamber.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design minimizes contamination by ensuring purge gas is used only where wafers are present, reducing waste and enhancing airflow control efficiency.
Implementation Method 1
supply purge gas to wafers stored in a storage chamber to remove fumes from the wafers
Implementation Method 2
divides the interior of the storage chamber into a plurality of storage regions through a plurality of blocking plates, thereby restricting the vertical flow of fumes and purge gas
Data Source
AI summary
The present invention relates to a wafer storage container for supplying purge gas to wafers stored in a storage chamber to remove fumes from the wafers or control the humidity of the wafers. In particular, the invention relates to a wafer storage container that divides the interior of the storage chamber into a plurality of storage regions through a plurality of blocking plates, thereby restricting the vertical flow of fumes and purge gas to minimize contamination inside the storage chamber and enabling purging of wafers in the desired storage region.