Wafer Cleaning Apparatus with Movable Partition Wall
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In semiconductor manufacturing, contaminants on wafer processing surfaces can interfere with subsequent processing steps, leading to device degradation and rejection, necessitating an effective cleaning process after each processing step.
Innovation Solution
A wafer cleaning apparatus and method utilizing a tank with a movable partition wall to separate the cleaning space into compartments, a wafer holder for immersion and movement between compartments, and a system for controlling fluid supply, agitation, and contamination detection to prevent re-adhesion of particles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a single-compartment cleaning tank is used, then the device complexity is low, but contaminating particles can re-adhere to the wafer after cleaning
Solution Approach 1:
The cleaning tank is divided into multiple compartments (first compartment for cleaning, second compartment for rinsing) by a partition wall. This segmentation prevents contaminating particles from re-adhering to the wafer by separating the cleaning environment from the rinsing environment, thereby improving cleaning effectiveness while maintaining a relatively simple overall structure.
Solution Approach 2:
The partition wall acts as an intermediary structure between the first and second compartments. It includes a passage that allows controlled fluid flow between compartments while preventing direct contact between cleaned wafers and contaminating particles, thus solving the re-adhesion problem without requiring complex mechanical systems.
2Ease of operation
If the partition wall is moved away from the bottom wall to form a passage, then wafer transfer between compartments is enabled, but the structural stability decreases
Solution Approach 1:
The partition wall is designed to be movable rather than fixed, allowing it to be positioned at different heights. When moved away from the bottom wall, it forms a passage that enables wafer transfer between compartments. The partition wall can be moved to different positions depending on operational needs, providing flexibility while maintaining structural integrity through controlled movement mechanisms.
Data Source
AI summary
The present disclosure provides a wafer cleaning apparatus and a cleaning method. The wafer cleaning apparatus includes a tank and a wafer holder. The tank includes a bottom wall, a lateral wall, and a partition wall. The lateral wall is connected to the bottom wall. The partition wall is movably mounted on the lateral wall and divides a cleaning space defined by the bottom wall and the lateral wall into a first compartment and a second compartment. A passage communicating with the first compartment and the second compartment is formed when the partition wall is moved away from the bottom wall and immersed in a cleaning fluid received in the cleaning space. The wafer holder is adapted to be immersed in the cleaning fluid and to move between the first compartment and the second compartment. The present disclosure further provides a method of cleaning the wafer.