Movable Shutter for Wafer Cleaning Nozzle Drip Protection
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Solution Overview
Problem
During the cleaning of wafers in integrated circuit production, residual liquid from cleaning nozzles can drip onto wafers, causing damage and exposure to unintended environments, and the dispensation of liquid and gas can also harm the wafers due to force, necessitating a solution to intercept and manage these issues effectively.
Innovation Solution
A shuttered wafer cleaning system is introduced, featuring a liquid-impermeable shutter that can be configured between on and off coverage positions, intercepting residual liquid while allowing gas to flow, and is actuated by a motor to move between positions based on the nozzle's active state, ensuring protection and efficient cleaning.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a shutter is positioned below the cleaning nozzle to intercept residual liquid, then liquid damage to wafers is prevented, but the shutter may interfere with gas dispensation and cleaning effectiveness
Solution Approach 1:
The shutter is made movable between a first position (below the nozzle) to intercept liquid and a second position (away from the nozzle path) to allow unobstructed gas flow. The actuator dynamically positions the shutter based on whether liquid or gas dispensing is active, resolving the contradiction between liquid protection and cleaning effectiveness.
2Object-affected harmful factors
If the shutter is positioned to intercept liquid droplets, then wafer protection is improved, but gas flow around the shutter may be restricted
Solution Approach 1:
The shutter dynamically transitions between positions: when liquid dispensing is active, the shutter is positioned to intercept liquid; when gas dispensing is active, the shutter moves away to allow full gas flow. This temporal separation resolves the contradiction between liquid interception and gas flow quantity.
3Object-affected harmful factors
If the shutter is always in position to catch liquid, then continuous protection is provided, but the shutter cannot be removed to allow proper gas cleaning
Solution Approach 1:
The shutter is actuated to move between a protective position (below the nozzle) when liquid dispensing occurs and a retracted position (away from the nozzle) when gas cleaning occurs. This dynamic operation provides continuous protection during liquid phases while ensuring accessibility during gas phases.
Solution Approach 2:
The system uses feedback from the dispensing instrument's active state to control shutter positioning. When the nozzle switches between liquid and gas dispensing modes, this state information triggers corresponding shutter position changes, ensuring the shutter is in the appropriate position for each operation phase.
4Object-affected harmful factors
If the shutter is made liquid-impermeable to effectively block liquid, then liquid interception is improved, but gas flow through the shutter may be insufficient
Solution Approach 1:
The shutter is positioned below the nozzle during liquid dispensing to block liquid while allowing gas to flow around its edges. During gas dispensing, the shutter moves away from the nozzle path entirely, eliminating any potential restriction on gas flow. This dynamic positioning resolves the contradiction between liquid blocking and gas flow quantity.
Data Source
AI summary
In an embodiment, a system includes: a wafer support configured to secure a wafer; a nozzle configured to dispense a liquid or a gas on the wafer when the nozzle is in an active state of dispensing; a shutter configured to catch the liquid from the nozzle when the shutter is in a first position below the nozzle; and a shutter actuator configured to: move the shutter to the first position in response to the nozzle not being in an inactive state; move the shutter to a second position away from the first position in response to the nozzle being in the active state.