Wafer Storage Container Cleaning Apparatus with Particle Measurement
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Wafer storage containers face contamination from particles due to the opening and closing of their doors and loading/unloading operations, necessitating a cleaning apparatus that can effectively assess the cleanliness within the storage space.
Innovation Solution
A wafer storage container cleaning apparatus is designed with a cleaning tank, lid unit, mounting unit, ejection units for cleaning liquids, and a particle measurement unit to detect particle-related information, ensuring the cleanliness of the storage space by discharging and measuring cleaning liquids.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If cleaning liquid is ejected into the storage space to clean particles, then the cleanliness of the storage space is improved, but particle information cannot be obtained to assess cleaning effectiveness
Solution Approach 1:
The particle measurement unit measures particles in the cleaning liquid before the cleaning liquid is ejected into the storage space. This preliminary measurement allows assessment of the cleaning liquid's particle content prior to cleaning operation, enabling prediction of cleaning effectiveness without contaminating the storage space with measurement equipment.
2Measurement precision
If a particle measurement unit is added to measure particles in the storage space, then particle information is obtained, but the device complexity increases
Solution Approach 1:
The through hole in the mounting unit serves as an intermediary channel that allows the particle measurement unit to access and measure particles in the cleaning liquid without requiring direct insertion of measurement equipment into the storage space. This mediator structure enables particle measurement while maintaining the integrity and simplicity of the storage container design.
3Productivity
If the door is opened for loading and unloading wafers, then operational efficiency is improved, but particles adhere to the inside of the storage space
Solution Approach 1:
The cleaning apparatus enables the storage container to clean itself by ejecting cleaning liquid into the storage space where particles have adhered. The mounting unit with through hole positions the container for self-cleaning, eliminating the need for disassembly or external cleaning equipment, thus maintaining productivity while removing contamination.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively detects particle information, indicating the cleanliness level within the storage space, enabling efficient cleaning and quality assurance of wafer storage containers.
Implementation Method 1
a first ejection unit that ejects a cleaning liquid into the storage space of the shell
Implementation Method 2
the particle measurement unit measures particles in the cleaning liquid discharged by the first discharge unit
Data Source
AI summary
According to an embodiment of the present disclosure, the cleaning apparatus includes a cleaning tank body having a body opening and a cleaning space; a lid provided to be openable and closable with respect to the body opening; a mounting stage provided in the cleaning space placing a shell of a wafer storage container; a first ejector that ejects a cleaning liquid into a storage space of the shell; a second ejector that ejects the cleaning liquid into an outer portion of the shell; a first discharge port that discharges the cleaning liquid ejected into the storage space of the shell; a second discharge port that discharges the cleaning liquid that has passed through the outer portion of the shell; and a particle counter that measures particles in the cleaning liquid discharged by the first discharge port.