Wafer Container Cleaning Device With Rotating Swingable Holders
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Solution Overview
Problem
Conventional wafer container cleaning devices are inefficient due to cumbersome attachment processes, inability to simultaneously clean container bodies and covers, and separate cleaning of interior and exterior surfaces, leading to prolonged cleaning times and reduced efficiency.
Innovation Solution
A wafer container cleaning device with a rotatable housing and swingable container holders that support both container bodies and covers upside down, allowing for simultaneous cleaning of interior and exterior surfaces with a sprayer nozzle system that rotates with the rotor for uniform cleaning solution application.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the conventional attachment method using upper and lower hooks is used, then the wafer containers can be securely held, but the attachment process becomes cumbersome and time-consuming
Solution Approach 1:
The container holder is divided into an upper holder and a lower holder that can be independently positioned and engaged. The upper holder engages with the upper end portion of the container body, while the lower holder engages with the lower end portion, allowing simultaneous attachment operations that reduce total attachment time while maintaining secure holding
Solution Approach 2:
The upper holder and lower holder are pre-positioned at appropriate locations on the rotating tray before the container is placed. This preliminary positioning eliminates the need for manual adjustment during attachment, enabling operators to quickly secure containers by simply placing them into the pre-positioned holders
2Device complexity
If the cleaning device is designed to clean only the container body, then the structure remains simple, but the cleaning process must be repeated for container covers, prolonging total cleaning time
Solution Approach 1:
The cleaning device is designed with universal cleaning capability that can handle both container bodies and container covers using the same cleaning mechanism. The rotating tray accommodates different container types, and the sprayer system automatically adapts to clean various surfaces, eliminating the need for separate cleaning operations and reducing total cleaning time
3Device complexity
If the cleaning device cleans the exterior and interior of the container body separately, then the cleaning mechanism remains simple, but the cleaning process is prolonged
Solution Approach 1:
The cleaning device enables continuous cleaning action by rotating the tray with containers positioned upright. The sprayer system continuously applies cleaning solution to both exterior and interior surfaces during rotation, eliminating the need to stop and reposition containers between exterior and interior cleaning operations
Solution Approach 2:
The cleaning approach transitions from sequential cleaning (exterior then interior) to simultaneous multi-dimensional cleaning. Containers are positioned upright and rotated, allowing the sprayer to access and clean both exterior and interior surfaces concurrently through rotational movement, effectively adding a temporal dimension to the cleaning process
Data Source
AI summary
A wafer container cleaning device for cleaning container bodies and container covers of wafer containers includes a housing having a cleaning chamber defined therein, a rotor rotatably installed within the cleaning chamber of the housing, a plurality of container holders mounted to the rotor to removably hold the container bodies and the container covers, and a cleaning solution sprayer nozzle for spraying a cleaning solution toward the container bodies and the container covers held by the container holders. Each of the container holders includes a support tray having a body support portion for supporting each of the container bodies in an upside down state and a cover support portion for supporting each of the container covers.