Wafer Storage Container Cleaning With Segmented Drainage and Exhaust
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Solution Overview
Problem
Existing wafer storage container cleaning apparatuses struggle to effectively reduce residual particles on the inner sides of containers like FOUPs and FOSBs, which accumulate when doors are opened or wafers are carried in and out, leading to contamination.
Innovation Solution
A cleaning apparatus with a cleaning chamber that supplies cleaning liquid to both the inner and outer sides of the container, utilizing separate drainage receivers and exhaust systems to efficiently remove particles, and includes rotating placement units with specific drainage and exhaust configurations to enhance particle removal.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Device complexity
If a single drainage receiver is used to collect cleaning liquid from both inner and outer sides, then the device complexity is reduced, but the cleaning effectiveness and particle removal capability deteriorate
Solution Approach 1:
The drainage system is segmented into two separate receivers: a first drainage receiver for collecting cleaning liquid from the inner side of the container and a second drainage receiver for collecting cleaning liquid from the outer side. This segmentation allows independent optimization of drainage paths for each surface, improving particle removal effectiveness while maintaining manageable system complexity through modular design
2Productivity
If cleaning liquid is supplied to both inner and outer sides simultaneously, then the cleaning efficiency is improved, but the loss of cleaning liquid increases
Solution Approach 1:
The cleaning liquid supply system is divided into separate channels for inner side and outer side cleaning. The first drainage receiver collects liquid from the inner side while the second drainage receiver collects liquid from the outer side, allowing for targeted cleaning approaches that reduce overall liquid consumption while maintaining high cleaning efficiency
Solution Approach 2:
The separated drainage receivers enable selective recovery or disposal of cleaning liquid based on contamination level. Cleaner liquid from one surface can be distinguished from more contaminated liquid from another surface, allowing for more efficient resource management and reduced waste
3Manufacturing precision
If the container is placed with opening facing downward on the stage, then the exhaust of storage space is improved, but the ease of operation deteriorates
Solution Approach 1:
The stage is designed to rotate, allowing the container to be dynamically repositioned during the cleaning process. The container can be placed opening-downward for effective exhaust and particle removal, then rotated to a convenient orientation for loading and unloading, combining the benefits of effective particle removal with ease of operation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively reduces residual particles on the inner sides of wafer storage containers by utilizing a dual drainage and exhaust system, ensuring thorough cleaning and drying, thereby minimizing contamination.
Implementation Method 1
a cleaning liquid supply that supplies a cleaning liquid to an inner side of the body that is a wall surface surrounding the storage space, and an outer side of the body that is an outer wall surface of the body, thereby cleaning the inner side and the outer side of the body
Implementation Method 2
an exhaust that exhausts the storage space formed by at least the inner side of the body
Implementation Method 3
a first drainage receiver receiving a drainage that is the cleaning liquid after cleaning the inner side of the body, and discharging the received drainage to an outside; a second drainage receiver receiving a drainage that is the cleaning liquid after cleaning the outer side of the body, and discharging the received drainage to the outside
Data Source
AI summary
According to one embodiment, a wafer storage container cleaning apparatus includes: a cleaning chamber accommodating a body of a wafer storage container, the body including a storage space storing semiconductor wafers and an opening of the storage space; a stage inside the cleaning chamber, having a placement surface for disposing the body thereon, and supporting the body by the placement surface; a cleaning liquid supply supplying a cleaning liquid to inner and outer sides of the body to clean the inner and outer sides; a first drainage receiver receiving drainage after cleaning the inner side of the body, and discharging the received drainage to outside; a second drainage receiver receiving drainage after cleaning the outer side of the body, and discharging the received drainage to outside; and an exhaust to exhaust the storage space formed by the inner side of the body.