Wafer Container Nozzle Layout for Air-Free Interior Cleaning
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Solution Overview
Problem
Existing wafer container cleaning methods fail to adequately clean the peripheral cavities and central cavity of the container body, as well as the minute parts of the cover, due to air entrapment and residual cleaning liquid, leading to incomplete cleaning and potential deterioration of the container.
Innovation Solution
A wafer container cleaner with liquid-supply nozzles facing the inner side of the depth wall and a liquid-discharge nozzle at the center, combined with an immersion-takeout movement mechanism, ensures thorough cleaning by circulating cleaning liquid and discharging air and residual liquid effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the container body is immersed in cleaning liquid with the container opening facing downward, then the cleaning liquid can reach the container interior, but air is trapped in the peripheral cavities and central cavity preventing sufficient cleaning
Solution Approach 1:
The patent applies preliminary action by providing discharge openings at the bottom of the container body before the cleaning process begins. These openings are specifically positioned to allow air to escape from the peripheral cavities and central cavity before cleaning liquid fills these spaces, thereby preventing air entrapment that would otherwise hinder effective cleaning.
Solution Approach 2:
The patent extracts the harmful air bubbles from the system by providing dedicated discharge openings that allow air to be removed from the container interior. The discharge openings are strategically placed at the lowest points where air would naturally accumulate, enabling air to be extracted as the container is filled with cleaning liquid.
2Manufacturing precision
If the cover is cleaned by shower method or immersion method, then the exterior surfaces are cleaned, but the cleaning liquid does not reach the minute parts and hollows of the latch mechanisms and front retainer
Solution Approach 1:
The patent applies segmentation by providing multiple discharge openings at different locations on the container body and cover. These openings are strategically positioned to target specific hard-to-reach areas such as the latch mechanisms and front retainer, allowing cleaning liquid to be directed into these minute parts and hollows that would otherwise be inaccessible to conventional cleaning methods.
Solution Approach 2:
The patent applies local quality by positioning discharge openings at specific locations where cleaning liquid is most needed. The openings are placed at the bottom and sides of the container body and cover, particularly near the latch mechanisms and front retainer, to ensure that cleaning liquid is delivered precisely to these minute parts and hollows that require special attention.
3Manufacturing precision
If the container body is immersed in cleaning water after cleaning liquid to remove residual cleaning liquid, then the cleaning water can wash the exterior surfaces, but cleaning liquid remains trapped inside the container body
Solution Approach 1:
The patent applies preliminary action by providing discharge openings at the bottom of the container body before the rinsing process begins. These openings allow trapped cleaning liquid to escape from the container interior as cleaning water is introduced, preventing residual cleaning liquid from remaining inside the container body after the rinsing process.
Solution Approach 2:
The patent extracts residual cleaning liquid from the container interior by providing discharge openings that allow the trapped liquid to be removed. As cleaning water is introduced into the container, the discharge openings enable the displaced cleaning liquid to escape, ensuring thorough removal of residual cleaning liquid that would otherwise remain trapped.
4Productivity
If conventional cleaning methods are used, then the cleaning process is simple, but the cleaning performance is insufficient due to air entrapment and residual liquid
Solution Approach 1:
The patent applies segmentation by dividing the cleaning function into multiple components: discharge openings at the bottom for air and liquid removal, and discharge openings at the sides for targeted cleaning of specific areas. This segmented approach enables thorough cleaning of all container surfaces including hard-to-reach areas, significantly improving cleaning efficiency while maintaining process simplicity.
Solution Approach 2:
The patent applies self-service by designing the container body and cover with integrated discharge openings that automatically facilitate air and liquid removal during the cleaning process. The discharge openings are positioned to naturally drain air and cleaning liquid as the container is filled and rinsed, eliminating the need for additional complex mechanisms while achieving superior cleaning performance.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves improved cleaning performance by ensuring complete coverage of the container interior and cover, reducing residual contamination and preventing age-related deterioration.
Implementation Method 1
at least one of the plurality of liquid-supply nozzles includes a liquid-supply opening through which the cleaning liquid or the cleaning water is discharged, the liquid-supply opening facing an inner side of the depth wall
Implementation Method 2
the liquid-discharge nozzle includes a discharge opening through which the to-be-discharged fluid is sucked in, the discharge opening facing a center of the inner side of the depth wall
Implementation Method 3
a wafer container cleaner for cleaning a wafer container including a container body for storing a plurality of wafers and a cover for closing a container opening of the container body, the wafer container being housed in a housing jig that allows fluid circulation therethrough
Data Source
AI summary
A wafer container cleaner includes a cleaning bath capable of accommodating a housing jig that houses a wafer container including a container body and a cover, liquid-supply nozzles for supplying cleaning liquid or the like into the cleaning bath, and a liquid-discharge nozzle for discharging to-be-discharged fluid out of the cleaning bath. The container body has a depth wall at a side opposite a container opening. In an accommodating state where the container body mounted on the storage fixture with the container opening facing downward is accommodated in the cleaning bath, the liquid-supply nozzles are provided so that respective liquid-supply openings through which the cleaning liquid or the like is discharged face an inner side of the depth wall and the liquid-discharge nozzle is provided so that a discharge opening through which the to-be-discharged fluid is sucked in faces a center of the inner side of the depth wall.