Wafer Groove Alignment for Accurate Cross-Section Measurement

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Solution Overview

Problem

Existing methods for measuring the shape of grooves on wafers require large data storage and processing capacity, and struggle with data loss and inaccurate shape generation due to steep inclined surfaces, especially when using three-dimensional image assembly of two-dimensional images.

Innovation Solution

An alignment method is employed to match the extending direction of the groove with the array direction of camera pixels, followed by one-dimensional conversion of images to generate cross-sectional shapes, reducing data requirements and improving accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If three-dimensional image assembly of two-dimensional images is used to measure groove shape, then three-dimensional image information can be generated, but large data storage capacity and processing capability are required which increases cost

Engineering Contradiction:
Improvethree-dimensional shape measurement accuracyVSAvoiddata storage and processing system complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent extracts only the essential information needed for groove shape measurement from the two-dimensional images, specifically focusing on extracting profile data along the groove extending direction rather than assembling complete three-dimensional image data. This selective extraction approach obtains the necessary measurement information while significantly reducing data storage and processing requirements.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent segments the image processing into specific functional steps: detecting the groove extending direction, aligning images along this direction, and extracting profile information at different Z positions. This segmentation allows efficient processing of individual image components rather than handling the entire three-dimensional data set, reducing overall system complexity.

Inventive Principle:
Principle #1Segmentation

2Measurement precision

If camera focuses on wall surfaces of groove during image pickup, then groove shape information can be obtained, but data loss occurs when inclined surfaces are steep making accurate three-dimensional shape generation difficult

Engineering Contradiction:
Improvegroove wall surface detection accuracyVSAvoiddata loss on steep inclined surfaces
Core Design Contradiction:
Measurement precisionVSLoss of information

Solution Approach 1:

The patent performs preliminary alignment of the camera imaging direction with the groove extending direction before actually capturing the groove wall surface images. By pre-aligning the imaging system so that the pixel array direction matches the groove orientation, the subsequent image acquisition is optimized to capture wall surface data without data loss, even on steep inclined surfaces.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent employs asymmetric alignment where the pixel array direction is specifically oriented to match the groove extending direction rather than using symmetric or arbitrary imaging angles. This asymmetric alignment ensures that the camera captures the groove walls at the optimal angle, preventing data loss on steep surfaces while maintaining measurement accuracy.

Inventive Principle:
Principle #4Asymmetry

Data Source

PatentUS12474164B2Alignment method, shape measuring method and shape measuring apparatus
Publication Date: 2025.11.18 TOKYO SEIMITSU CO LTD
  • US12474164B2 patent drawing
  • US12474164B2 patent drawing
  • US12474164B2 patent drawing

AI summary

The alignment method includes detecting an extending direction of a groove formed on a wafer, based on an image of the wafer picked up by a camera, and performing alignment so as to adjust the extending direction of the groove to be parallel to an array direction of pixels of the camera by relatively rotating the wafer and the camera.