Wafer Holding Device Parallel Retention Mechanism

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Solution Overview

Problem

Conventional wafer pods fail to securely retain wafers without causing damage or particulate release due to non-parallel movement of link-bars, leading to quivering and undesired contact with wafers.

Innovation Solution

A wafer holding device with a support frame, actuating frame, rotating arms, and wafer retainers that apply forces parallel to the edge surface of the wafers, utilizing high wear-resisting materials and rollers to ensure secure retention and minimize particulate release.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional link-bar retaining mechanisms are used to securely retain wafers, then wafers are held in place, but the non-parallel movement of link-bars causes wafers to quiver and rub against the link-bars, resulting in damage and particulate release

Engineering Contradiction:

Improvewafer retention securityVSAvoidwafer damage and particulate release

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

Instead of using link-bars that move in non-parallel directions (conventional approach), the invention inverts the approach by using retainers that move in directions parallel to the wafer surface. The retainers are configured to approach and contact the wafer edges from opposite sides simultaneously, ensuring uniform retention without quivering or rubbing that causes damage and particulate release.

Inventive Principle:

Principle #13The other way round (Inversion)

Solution Approach 2:

The invention changes the motion parameter of the retaining mechanism from non-parallel link-bar movement to parallel retainer movement relative to the wafer surface. By adjusting the orientation and movement direction of the retainers to be parallel to the wafer surface, the system achieves secure retention while eliminating the harmful quivering and rubbing motions that cause wafer damage.

Inventive Principle:

Principle #35Parameter changes

2Stability of the object's composition

If link-bars are used to retain wafers in conventional wafer pods, then wafers are secured against vibration and shake, but the movement direction causes wafers to quiver and rub against the link-bars

Engineering Contradiction:

Improvewafer stability during transportationVSAvoidparticulate release from wafer rubbing

Core Design Contradiction:

Stability of the object's compositionVSObject-generated harmful factors

Solution Approach 1:

The invention inverts the conventional link-bar mechanism by using retainers that move parallel to the wafer surface rather than at angles. This inversion ensures that the retainers stabilize the wafer without causing quivering or rubbing motions, thereby eliminating particulate release while maintaining stability during transportation.

Inventive Principle:

Principle #13The other way round (Inversion)

Solution Approach 2:

The invention converts the potential harm of retainer-wafer contact into a beneficial interaction by ensuring the contact occurs in a direction parallel to the wafer surface. This controlled contact provides stable retention while preventing the harmful rubbing and particulate release that occurs with non-parallel link-bar movement.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

3Reliability

If conventional retaining mechanisms are used to hold wafers securely, then wafers do not move due to vibration or shake, but damage and particulate release still occur

Engineering Contradiction:

Improvewafer retention against vibrationVSAvoidwafer integrity

Core Design Contradiction:

ReliabilityVSStrength

Solution Approach 1:

The invention inverts the conventional approach by using retainers that move parallel to the wafer surface instead of non-parallel link-bars. This inversion allows the retainers to provide secure retention against vibration and shake while maintaining wafer integrity, as the parallel motion prevents quivering and rubbing that would compromise wafer strength.

Inventive Principle:

Principle #13The other way round (Inversion)

Solution Approach 2:

The invention changes the motion parameter of the retaining mechanism to be parallel to the wafer surface, which allows secure retention while preserving wafer integrity. By adjusting the orientation of the retainers and their movement direction, the system achieves both reliable retention against vibration and protection of wafer strength.

Inventive Principle:

Principle #35Parameter changes

Data Source

PatentUS7556153B2Wafer pod and wafer holding device thereof

Publication Date: 2009.07.07 GUDENG PRECISION IND CO LTD

AI summary

A wafer holding device for a wafer pod is disclosed. The disclosed wafer holding device includes a support frame mounted on one side of the housing of the wafer pod, an actuating frame, two rotating arms and two wafer retainers. When the housing and the base of a wafer pod are assembled, the actuating frame moves and forces the wafer retainers to rotate in a direction perpendicular to the edge surface of the wafers.