Wafer Surface Hydrophobic Treatment for Uniform Pre-Bonding

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Solution Overview

Problem

The high bond wave speed on hydrophilic wafer surfaces during pre-bonding leads to distortion and potential trapping of air bubbles or moisture during wafer bonding processes, which can compromise the integrity of the bonding process.

Innovation Solution

A surface treatment process is applied to convert hydrophilic wafer surfaces to hydrophobic surfaces using chemicals like Hexamethyldisilazane (HMDS), Aminopropyltriethoxysilane (APTES), or (3-mercaptopropyl) trimethoxysilane (MPTMS), reducing the bond wave speed and minimizing distortion.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If pre-bonding is performed on hydrophilic wafer surfaces, then bonding can proceed without additional surface treatment, but the high bond wave speed causes distortion and air bubble trapping

Engineering Contradiction:
Improvebonding process simplicityVSAvoidbonding uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies surface treatment (such as plasma treatment or chemical treatment with HMDS) to the wafer surfaces before the pre-bonding step. This preliminary action modifies the surface properties to be hydrophobic, which then enables the pre-bonding to proceed with reduced bond wave speed and minimal distortion, eliminating the need for additional distortion compensation measures during bonding

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent changes the surface property parameter from hydrophilic to hydrophobic through surface treatment. This parameter change directly affects the bond wave speed during pre-bonding, reducing it from a high value that causes distortion to a controlled value that enables uniform bonding without air bubble trapping

Inventive Principle:
Principle #35Parameter changes

2Productivity

If pre-bonding is performed on hydrophilic wafer surfaces, then the process can be completed quickly, but distortion and air bubble trapping occur

Engineering Contradiction:
Improvebonding process speedVSAvoidbonding quality
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The surface treatment is performed as a preliminary step before pre-bonding to establish hydrophobic surface properties. This preparation enables the subsequent pre-bonding to proceed quickly without the harmful effects of high bond wave speed, thus maintaining both high productivity and high reliability

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The surface treatment creates a preliminary anti-action by making the surface hydrophobic, which counteracts the tendency for high bond wave speed and associated distortion. This preliminary counter-measure prevents the occurrence of bonding defects before they can happen during the pre-bonding process

Inventive Principle:
Principle #9Preliminary anti-action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The treatment results in a more uniform bond wave propagation, reducing distortion and air/moisture trapping, thereby enhancing the bonding process and improving the quality of the wafer connections.

Implementation Method 1

performing a first treatment process on the first wafer, wherein the first treatment process results in the first wafer to be more hydrophobic than before the first treatment process

Methodology Applied
Scientific EffectHydrophobicity: Hydrophobe

Data Source

PatentUS20250239564A1Treatment process for wafer bonding processes
Publication Date: 2025.07.24 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US20250239564A1 patent drawing
  • US20250239564A1 patent drawing
  • US20250239564A1 patent drawing

AI summary

A method includes performing a plasma treatment on a first wafer, performing a treatment process on the first wafer, wherein the treatment process results in the first wafer to be more hydrophobic than before the treatment process, pre-bonding the first wafer to a second wafer through wafer-to-wafer bonding, and performing an annealing process to bond the first wafer to the second wafer.