Segmented Ion Collector Layout for Wafer Ion Distribution Mapping
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Plasma systems in semiconductor manufacturing face challenges in monitoring and maintaining uniform ion distribution across large wafers, which affects the yield and quality of semiconductor devices.
Innovation Solution
A segmented ion collector design with physically and electrically isolated segments around the wafer, each with a conductive element to measure ion distribution, coupled with a control system that adjusts plasma parameters in real-time to ensure uniformity, and a continuous ion collector with a rotating window for comprehensive plasma ion distribution monitoring.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a single continuous ion collector is used, then the structure is simple, but the measurement precision of ion distribution uniformity is insufficient
Solution Approach 1:
The ion collector is divided into multiple discrete segments arranged in a circular pattern around the wafer. Each segment independently measures ion flux from a specific angular position, enabling precise mapping of ion distribution uniformity across the wafer surface while maintaining a relatively simple overall structure.
2Measurement precision
If multiple segments are used to measure ion distribution, then the measurement precision improves, but the device complexity increases
Solution Approach 1:
Each segment of the ion collector serves multiple functions: it acts as both a measurement electrode for ion flux detection and as part of the plasma discharge structure. The segments are electrically isolated from each other, allowing independent measurement while maintaining structural integrity and simplicity.
3Productivity
If real-time monitoring is implemented, then the productivity improves through immediate adjustments, but the device complexity increases due to control systems
Solution Approach 1:
The ion collector segments provide real-time measurement of ion distribution uniformity, which feeds back to the plasma generation system. This feedback enables dynamic adjustment of plasma parameters to maintain uniform ion distribution across the wafer, improving productivity through immediate corrections without requiring complex external control systems.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables precise monitoring and adjustment of plasma uniformity, enhancing the accuracy of semiconductor device production by maintaining consistent ion distribution across wafer surfaces, thereby improving device yield and quality.
Implementation Method 1
Each of the segments includes a conductive element that is designed to conduct a current based on ions received from a plasma
Implementation Method 2
Plasma systems are frequently used in the industry for performing various semiconductor manufacturing processes
Data Source
AI summary
An ion collector includes a plurality of segments and a plurality of integrators. The plurality of segments are physically separated from one another and spaced around a substrate support. Each of the segments includes a conductive element that is designed to conduct a current based on ions received from a plasma. Each of the plurality of integrators is coupled to a corresponding conductive element. Each of the plurality of integrators is designed to determine an ion distribution for a corresponding conductive element based, at least in part, on the current conducted at the corresponding conductive element. An example benefit of this embodiment includes the ability to determine how uniform the ion distribution is across a wafer being processed by the plasma.