Wafer-Level Optical Unit for High Pixel Count Imaging
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Solution Overview
Problem
Existing wafer level optics techniques are not sufficient for high pixel count imaging systems, as they fail to adequately reduce axial chromatic aberration and other optical aberrations, making them impractical for more than three megapixels.
Innovation Solution
The design of an optical unit comprising a first and second lens group, each comprising specific lens elements and transparent bodies with buffer layers, optimized with refractive indices, Abbe numbers, and curvature radii to minimize aberrations, forming a compact imaging lens suitable for high pixel count applications.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If wafer level optics technique is used for mass production, then manufacturing cost is reduced and productivity is improved, but optical performance deteriorates due to insufficient reduction of axial chromatic aberration and other aberrations
Solution Approach 1:
The optical unit is divided into two lens groups, each with specific lens elements and transparent bodies, allowing independent optimization of each group for aberration correction while maintaining wafer-level manufacturing benefits
Solution Approach 2:
Specific parameter ranges are defined for refractive indices (nd1: 1.4-1.7, nd2: 1.5-1.8, nd3: 1.6-1.9), Abbe numbers (vd1: 30-60, vd2: 20-50, vd3: 25-55), and curvature radii to optimize the balance between manufacturing feasibility and optical performance for high pixel count imaging
2Manufacturing precision
If lens design is optimized for high pixel count imaging, then optical performance is improved, but device complexity increases
Solution Approach 1:
The lens groups are designed to perform multiple functions simultaneously: the first lens group with positive power provides primary focusing while the second lens group with negative power corrects chromatic aberration and other optical aberrations, achieving high-performance imaging with a relatively simple structure suitable for wafer-level manufacturing
3Manufacturing precision
If axial chromatic aberration is reduced through optical design, then imaging quality is improved, but manufacturing difficulty increases
Solution Approach 1:
Specific parameter ranges are defined for refractive indices (nd1: 1.4-1.7, nd2: 1.5-1.8, nd3: 1.6-1.9), Abbe numbers (vd1: 30-60, vd2: 20-50, vd3: 25-55), and curvature radii to optimize the balance between manufacturing feasibility and optical performance for high pixel count imaging
Solution Approach 2:
The optical unit is divided into two lens groups, each with specific lens elements and transparent bodies, allowing independent optimization of each group for aberration correction while maintaining wafer-level manufacturing benefits
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces optical aberrations, achieving superior imaging performance and compactness, enabling mass production at lower costs while maintaining high optical quality, suitable for applications in digital cameras and small electronic devices.
Implementation Method 1
the first lens group includes a first lens element, a first transparent body and a second lens element, which are arranged in order from an object side toward an image surface side, and in which the second lens group includes a third lens element, a second transparent body and a fourth lens element
Data Source
AI summary
An optical unit includes: a first lens group; and a second lens group, which are arranged in order from an object side toward an image surface side, wherein the first lens group includes a first lens element, a first transparent body, and a second lens element, which are arranged in order from the object side toward the image surface side, and the second lens group includes a third lens element, a second transparent body and a fourth lens element, which are arranged in order from the object side toward the image surface side.


