Wafer-Level Underfill Laser Stealth Dicing

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Solution Overview

Problem

Current methods for dicing semiconductor wafers, such as scribing and sawing, result in chipping, cracking, and waste of wafer real estate due to jagged separation lines and the need for significant spacing between dice, while plasma dicing faces cost and implementation limitations.

Innovation Solution

A stealth dicing method involving laser irradiation from the backside of the wafer to generate defects along dicing streets, followed by mechanical singulation, which allows for clean separation and reduced waste by using a wafer-level underfill material layer.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If scribing or sawing is used to dice wafers, then the wafer can be separated into individual dice, but chipping and cracking occur along the severed edges and additional spacing must be added between dice

Engineering Contradiction:
Improvewafer real estate utilizationVSAvoidedge quality of dice
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent replaces traditional mechanical dicing methods (scribing with diamond tips or sawing with rotating blades) with a laser-based system. The laser irradiates the wafer from the backside to generate defects along the dicing streets, which then guide crack propagation to achieve clean separation without mechanical contact. This substitution eliminates the chipping and cracking caused by mechanical forces while allowing dice to be placed closer together, improving wafer real estate utilization.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Productivity

If sawing is used with a thick blade, then the wafer can be cut through, but three to five hundred microns must separate the circuitry to prevent damage

Engineering Contradiction:
Improvewafer real estate utilizationVSAvoiddamage to integrated circuits
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The patent replaces the mechanical sawing process with laser irradiation that generates defects and guides crack propagation without physical contact. This eliminates the need for large spacing (three to five hundred microns) required when using thick saw blades, as the laser method does not mechanically stress the wafer or generate particulate contamination that could damage the integrated circuits.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent introduces laser-generated defects as an intermediary mechanism between the laser energy and the final crack propagation. These defects act as stress concentrators that guide the crack along the desired dicing street path, enabling precise separation without the need for large safety margins around the circuitry.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Manufacturing precision

If scribing is used, then thin wafers can be separated, but only one side of the die can be scribed in the direction of the crystalline structure resulting in jagged separation lines

Engineering Contradiction:
Improveseparation line qualityVSAvoiddicing process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent inverts the traditional scribing approach by irradiating the wafer from the backside rather than the front side. This allows the laser to generate defects and guide crack propagation through the entire wafer thickness without being constrained by the crystalline structure orientation on the front surface, resulting in clean separation lines on both sides of each die.

Inventive Principle:
Principle #13The other way round (Inversion)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables precise and clean separation of dice with reduced chipping and cracking, optimizing wafer real estate usage and overcoming the limitations of traditional dicing methods.

Implementation Method 1

laser irradiating the semiconductor wafer from a backside of the semiconductor wafer to generate defects along dicing streets of the semiconductor wafer

Methodology Applied
Scientific EffectLaser ablation: Laser Ablation

Data Source

PatentUS9093518B1Singulation of wafers having wafer-level underfill
Publication Date: 2015.07.28 APPLIED MATERIALS INC
  • US9093518B1 patent drawing
  • US9093518B1 patent drawing
  • US9093518B1 patent drawing

AI summary

Methods of dicing semiconductor wafers, each wafer having a plurality of integrated circuits, are described. In an example, a method of dicing a wafer involves providing a semiconductor wafer having integrated circuits on a front side thereof, and having a wafer-level underfill material layer disposed on the integrated circuits. The method also involves laser irradiating the semiconductor wafer from a backside of the semiconductor wafer to generate defects along dicing streets of the semiconductor wafer, the dicing streets oriented between the integrated circuits. The method also involves, subsequent to the laser irradiating, mechanically singulating the integrated circuits along the dicing streets.