Liquid Detection in Wafer Processing via Absorptive Conductive Pathway
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Solution Overview
Problem
Current wafer processing devices lack an efficient and automated method for detecting liquid presence, which can lead to equipment damage and require manual inspection, increasing the risk of operational disruptions and maintenance costs.
Innovation Solution
An apparatus with a first and second conductor surrounded by liquid absorption material, where a power source generates a current through a conductive pathway established when liquid is absorbed, allowing for automatic detection of liquid presence and triggering maintenance operations or disconnecting the liquid cooling system to prevent further damage.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Extent of automation
If manual inspection is used to detect liquid presence, then detection can be performed without additional automated components, but it increases operational disruptions and maintenance costs due to human intervention requirements
Solution Approach 1:
The liquid detection system performs self-diagnosis by automatically detecting liquid presence through conductive pathways formed when liquid absorbs into the porous material between conductors, eliminating the need for manual inspection and enabling the system to monitor its own health status
Solution Approach 2:
The patent replaces manual mechanical inspection with an automated electrical detection system that uses conductive pathways and current measurement to detect liquid presence, substituting human-operated mechanical processes with automated electrical sensing
2Reliability
If no liquid detection system is implemented, then the device structure remains simple, but equipment damage and operational disruptions occur due to undetected liquid presence
Solution Approach 1:
The detection system performs preliminary detection of liquid presence before liquid can cause damage to electronic components, allowing the system to take preventive action by disconnecting power or alerting operators before harmful effects occur
Solution Approach 2:
The porous absorption material serves as a preliminary barrier that absorbs liquid before it can reach sensitive electronic components, providing a cushioning effect that prevents direct contact between liquid and vulnerable parts while the detection system monitors for its presence
3Productivity
If continuous manual monitoring is performed to prevent equipment damage, then liquid presence can be detected, but operational efficiency decreases due to constant human intervention
Solution Approach 1:
The system continuously self-monitors for liquid presence without requiring human intervention, automatically detecting conditions and triggering appropriate responses, thereby maintaining high operational efficiency while ensuring continuous protection
Solution Approach 2:
The detection system operates continuously during wafer processing, maintaining constant surveillance for liquid presence without interrupting production workflows, ensuring uninterrupted protection while maximizing operational efficiency
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables automatic and reliable detection of liquids in wafer processing devices, reducing the need for manual inspection and minimizing damage by automatically disconnecting the liquid supply, thus preventing equipment damage and operational interruptions.
Implementation Method 1
When the liquid absorption material absorbs the liquid, the liquid absorption material establishes a conductive pathway between the first conductor and the second conductor
Implementation Method 2
the liquid absorption material absorbs the liquid in the wafer processing device
Data Source
AI summary
An apparatus to detect a liquid in a wafer processing device is provided. The apparatus includes a first conductor proximate the wafer processing device. The apparatus includes a second conductor spaced apart from the first conductor and proximate the wafer processing device. The apparatus includes a liquid absorption material surrounding the first conductor and the second conductor. The apparatus includes a current source coupled to the first conductor. The apparatus includes a current detector coupled to at least one of the first conductor or the second conductor. The liquid absorption material establishes a conductive pathway between the first conductor and the second conductor when the liquid absorption material absorbs the liquid in the wafer processing device. A current is generated, by the current source, in at least one of the first conductor or the second conductor through the conductive pathway. The current detector detects the current.