Wafer Liquid Nozzle Static Throttle for Drip-Free Dispensing
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Solution Overview
Problem
Existing wafer processing apparatuses, such as those described in U.S. Pat. No. 9,799,539B2, can generate or trap particles due to moving parts in check valves, leading to contamination of processing liquids and wafers, and may not effectively prevent drips when the liquid supply is stopped.
Innovation Solution
A liquid dispenser with a static throttle comprising a plurality of flow passages is used in the nozzle assembly, eliminating moving parts and preventing drips by ensuring a well-developed and uniform velocity profile at the nozzle tip, thus avoiding particle generation and contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a check valve with moving parts is used to prevent liquid drips, then drip prevention is improved, but particle generation and contamination increase
Solution Approach 1:
The patent replaces the mechanical check valve system with moving parts with a static throttle system that uses flow control through a specific geometric structure. The static throttle comprises a body with a flow control opening that restricts liquid flow without any moving components, thereby preventing particle generation from mechanical wear while maintaining drip prevention through controlled flow characteristics
Solution Approach 2:
The patent changes the flow control parameter from mechanical valve position to fixed geometric opening dimensions. The static throttle uses a specifically designed flow control opening with defined dimensions and shape to regulate liquid flow, replacing the variable mechanical valve opening with a fixed geometric parameter that provides consistent flow control without particle generation
2Reliability
If a check valve with moving parts is used to prevent liquid drips, then drip prevention is improved, but contamination of processing liquid increases
Solution Approach 1:
The patent eliminates the mechanical valve system that generates contamination through wear particles by implementing a static throttle with a fixed geometric flow control opening. This static structure prevents contamination of the processing liquid while maintaining effective drip prevention through controlled flow restriction
Solution Approach 2:
The patent extracts and removes the moving parts from the flow control mechanism, leaving only the static throttle body with the flow control opening. By taking out the valve element and spring, the system eliminates the source of particle generation and contamination while retaining the essential function of flow control and drip prevention
3Object-generated harmful factors
If a static throttle with flow passages is used, then particle generation is reduced, but liquid distribution uniformity must be maintained
Solution Approach 1:
The patent applies local quality by designing the flow control opening with specific geometric characteristics at the critical flow restriction location. The opening has a defined shape and size that creates appropriate flow conditions, while the static throttle body provides structural support. This localized geometric design ensures uniform liquid distribution while maintaining the particle-free advantage of the static structure
Solution Approach 2:
The patent segments the flow control function into a dedicated static throttle component with a specific flow control opening, separate from the nozzle and liquid delivery system. This segmentation allows the flow control geometry to be optimized independently for uniform liquid distribution while maintaining the overall particle-free static structure
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The static throttle configuration effectively prevents drips from forming when the liquid supply is stopped, reducing particle generation and contamination, and ensures efficient liquid distribution during processing.
Implementation Method 1
a static throttle between the inlet portion and the dispensing nozzle, the static throttle comprising a plurality of flow passages through which the processing liquid can flow from the inlet portion to the dispensing nozzle
Implementation Method 2
ensuring a well-developed and uniform velocity profile at the nozzle tip
Data Source
AI summary
An apparatus for processing a wafer-shaped article, the apparatus comprising: a support for supporting the wafer-shaped article; and a liquid dispenser for dispensing a processing liquid onto a surface of the wafer-shaped article supported by the support; wherein the liquid dispenser comprises a nozzle assembly, the nozzle assembly comprising: an inlet portion; a dispensing nozzle; and a static throttle between the inlet portion and the dispensing nozzle, the static throttle comprising a plurality of flow passages through which the processing liquid can flow from the inlet portion to the dispensing nozzle.