Wafer Polishing-to-Cleaning Transfer for Precise Wet Bath Loading

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Solution Overview

Problem

Current semiconductor wafer processing systems lack automation in transferring wafers from polishers to wet baths for cleaning, leading to inefficiencies and increased production costs due to the need for manual handling, which can result in wafer damage.

Innovation Solution

A semiconductor wafer processing system that includes a controller, a transfer robot, a wet bath, and an automated guided vehicle (AGV) to automate the transfer and cleaning of wafers, using a cassette to hold the wafers and ensuring precise positioning to prevent damage.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If manual transfer using vacuum pencils is used, then wafer handling is simple and equipment cost is low, but production efficiency is low and wafer damage risk increases

Engineering Contradiction:
Improveproduction efficiencyVSAvoidequipment complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The system enables automated self-service transfer where the robot arm with vacuum pencil automatically picks up wafers from the polisher and places them in the wet bath without human intervention, thereby increasing productivity while maintaining relatively simple equipment structure

Inventive Principle:
Principle #25Self-service

Solution Approach 2:

The robot arm serves multiple functions: it transfers wafers between different stations (polisher to wet bath), positions cassettes, and handles various wafer manipulation tasks, replacing multiple specialized manual operations with a single multi-functional device

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Productivity

If automated robot transfer is implemented, then production efficiency increases, but wafer damage risk increases due to lack of precision handling

Engineering Contradiction:
Improveproduction efficiencyVSAvoidwafer integrity
Core Design Contradiction:
ProductivityVSReliability

Solution Approach 1:

The system replaces manual mechanical handling with automated robotic manipulation controlled by a PLC, using vacuum pencils for contactless or minimal-contact wafer handling, thereby maintaining wafer integrity while achieving automation

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The controller receives feedback from sensors and operators to adjust robot arm movements and vacuum pencil positioning, ensuring precise and gentle wafer handling that prevents damage while maintaining high transfer speed

Inventive Principle:
Principle #23Feedback

3Ease of manufacture

If manual wafer transfer is used, then equipment cost is low, but production cost increases due to lower efficiency

Engineering Contradiction:
Improveequipment costVSAvoidproduction efficiency
Core Design Contradiction:
Ease of manufactureVSProductivity

Solution Approach 1:

The automated transfer system is divided into modular components (robot arm, vacuum pencils, controller, cassette system) that can be independently manufactured and assembled, reducing overall equipment cost while enabling automated high-efficiency operation

Inventive Principle:
Principle #1Segmentation

Data Source

PatentEP4186092B1Automated semiconductor substrate polishing and cleaning
Publication Date: 2024.12.11 GLOBALWAFERS CO LTD
  • EP4186092B1 patent drawingFigure 1
  • EP4186092B1 patent drawingFigure 2
  • EP4186092B1 patent drawingFigure 3

AI summary

A semiconductor wafer processing system for processing a set of semiconductor wafers includes a controller, a transfer robot controlled by the controller, a wet bath for containing a cleaning solution, and a cassette positioned in the wet bath for holding the set of wafers. The transfer robot transfers the wafer from a transfer location to the cassette and the controller controls the transfer robot during the transfer.