Wafer Scheduling Simulation for Multi-Chamber Throughput Bottlenecks

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Solution Overview

Problem

Manufacturing processes face challenges in efficiently scheduling resources, leading to reduced throughput and product quality due to variations in product idle time and resource conflicts.

Innovation Solution

A simulation-based optimization technique using machine learning models to determine resource scheduling for manufacturing tools, which involves determining resource durations, updating machine learning models, performing computer simulations, and optimizing schedules to minimize idle times and resource conflicts.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If traditional scheduling methods based on industry experience and past experiments are used, then the scheduling process is simple to implement, but manufacturing throughput and resource utilization are reduced due to variations in product idle time and resource conflicts

Engineering Contradiction:
Improvemanufacturing throughputVSAvoidscheduling system complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The system performs computer simulations to predict future resource availability and product idle times before actual manufacturing occurs. By simulating different scheduling scenarios in advance and updating machine learning models with historical duration data, the system proactively identifies and resolves potential resource conflicts and idle time issues before they impact throughput

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The system continuously updates machine learning models with actual manufacturing duration data from completed tasks. This feedback loop allows the system to learn from past performance, improve prediction accuracy for resource availability and task durations, and progressively optimize scheduling decisions to increase throughput while managing complexity

Inventive Principle:
Principle #23Feedback

2Loss of time

If resource scheduling is optimized to reduce product idle time, then manufacturing efficiency improves, but the complexity of determining and adjusting schedules increases

Engineering Contradiction:
Improveproduct idle timeVSAvoidscheduling determination complexity
Core Design Contradiction:
Loss of timeVSDevice complexity

Solution Approach 1:

The system replaces manual, experience-based scheduling with an automated machine learning model that predicts task durations and resource availability. This substitution of mechanical/e human decision-making with computational algorithms reduces the complexity of determining optimal schedules while effectively minimizing product idle time through data-driven predictions

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Measurement precision

If machine learning models are updated with actual duration data, then prediction accuracy improves, but the time and computational resources required for model updating increase

Engineering Contradiction:
Improveduration prediction accuracyVSAvoidmodel updating time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The system updates machine learning models with actual duration data from manufacturing tasks, but appears to use incremental or selective updating rather than complete retraining. This partial action approach improves prediction accuracy over time while minimizing the time and computational resources required compared to full model retraining, balancing precision gains with operational efficiency

Inventive Principle:
Principle #16Partial or excessive action

Data Source

PatentUS20250062144A1Predictive wafer scheduling for multi-chamber semiconductor equipment
Publication Date: 2025.02.20 APPLIED MATERIALS INC
  • US20250062144A1 patent drawing
  • US20250062144A1 patent drawing
  • US20250062144A1 patent drawing

AI summary

A method includes identifying, by at least one processing device from a set of wafers, an idle wafer that is idle for a duration that exceeds a predefined threshold value, wherein each wafer of the set of wafers is associated with a respective start time of a set of start times, and initiating, by the at least one processing device, a computer simulation forecasting processing of the set of wafers using a wafer modification chamber and a wafer movement chamber based on a modified set of start times, wherein the computer simulation uses a machine learning model trained to perform a first manufacturing task using the wafer modification chamber and to perform a second manufacturing task using the wafer movement chamber, and wherein the modified set of start times is obtained by modifying at least one start time of the set of start times.