Wafer Sensor Rotation Calibration for Precise Process Sensing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing semiconductor process sensing apparatuses face challenges in accurately measuring and maintaining process states due to difficulties in continuous measurement and evaluation, leading to inaccuracies in sensing various parameters.
Innovation Solution
A method for correcting errors in a wafer-like sensing apparatus involves rotating sensors arranged along a virtual circumference, calculating a representative value from multiple measurements, and using unique errors of each sensor to calibrate and correct the apparatus.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If multiple sensors are used to repeatedly sense physical quantity at the same measurement point by rotating the wafer-like sensing apparatus, then measurement precision is improved, but device complexity increases
Solution Approach 1:
The sensing apparatus is divided into multiple independent sensors arranged along a virtual circumference, each capable of sensing physical quantities. By segmenting the sensing function across multiple sensors that can be rotated into position, the system achieves high measurement precision through repeated measurements while managing complexity through modular sensor design
Solution Approach 2:
The wafer-like sensing apparatus incorporates rotational capability that allows dynamic repositioning of sensors to align with the measurement point. This dynamic adjustment enables multiple sensors to sequentially measure the same physical quantity, improving precision through data aggregation while using a single rotating platform rather than multiple fixed sensing stations
2Measurement precision
If unique errors of each sensor are calculated and corrected, then measurement precision is improved, but calculation complexity increases
Solution Approach 1:
The system calculates unique errors for each sensor based on repeated measurements and uses this error information to correct subsequent measurements. This feedback mechanism continuously improves measurement precision by compensating for individual sensor deviations, while the error calculation is performed systematically using representative values from multiple measurements
Solution Approach 2:
The sensing apparatus performs self-calibration by using its own repeated measurements to calculate representative values and determine unique errors for each sensor. This self-service approach enables automatic error correction without requiring external calibration equipment or complex manual adjustment procedures
Data Source
AI summary
A method of correcting an error of a wafer-like sensing apparatus includes repeatedly sensing a physical quantity at a same measurement point by rotating a wafer-like sensing apparatus having a plurality of sensors arranged along a virtual circumference, calculating a representative value from a plurality of measurement values extracted through the repeated sensing and calculating a unique error of each of the plurality of sensors by using the representative value, and correcting an error of the wafer-like sensing apparatus by using the unique error of each of the plurality of sensors.