Wafer Protective Sheet Lamination for Uniform Resin Wetting

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Solution Overview

Problem

The existing methods for protecting wafers during grinding often result in poor surface accuracy due to inadequate wettability of the liquid resin on the base film, leading to unfilled regions and adhesion issues with the chuck table, which complicates the peeling process.

Innovation Solution

A method involving a first protective sheet with a non-adhesive portion over the device region and an adhesive portion around the outer circumferential region, combined with a second protective sheet having surface irregularities, where a liquid resin is dropped and cured using an external stimulus to ensure even coverage and easy removal.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a liquid resin is dropped onto a base film with poor wettability, then the liquid resin cannot spread evenly, but this leaves unfilled regions that reduce surface accuracy

Engineering Contradiction:
Improvesurface accuracyVSAvoidwettability
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The invention changes the surface parameter of the base film by forming a roughness layer with controlled surface roughness (Ra 0.03 to 3 μm). This parameter change improves wettability of the liquid resin, enabling even spreading across the base film surface and eliminating unfilled regions, thereby resolving the contradiction between surface accuracy and wettability

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The roughness layer creates a porous or micro-structured surface on the base film that enhances capillary action and liquid resin penetration. This porous structure increases the effective contact area between liquid resin and base film, improving wetting behavior and ensuring complete coverage without reducing surface accuracy

Inventive Principle:
Principle #31Porous materials

2Ease of manufacture

If a base film is used without surface treatment, then the structure is simple, but the liquid resin does not spread properly causing unfilled regions

Engineering Contradiction:
Improveprocess simplicityVSAvoidsurface accuracy
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

Instead of complex surface treatments, the invention applies a simple roughness layer formation process that changes only the surface roughness parameter of the base film. This minimal intervention maintains manufacturing simplicity while effectively improving liquid resin spreading and surface accuracy

Inventive Principle:
Principle #35Parameter changes

3Reliability

If the base film has high adhesion to the chuck table, then the wafer is securely held, but peeling the base film becomes time-consuming

Engineering Contradiction:
Improveholding stabilityVSAvoidpeeling time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The invention applies local quality by creating a roughness layer only on the surface of the base film that contacts the liquid resin, while maintaining appropriate adhesion properties at the chuck table interface. This localized modification allows secure holding during processing while enabling easy peeling afterward, resolving the contradiction between holding stability and peeling time

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enhances the surface accuracy of the wafer's reverse side during grinding by preventing resin-filled regions and simplifying the peeling process, thereby improving the grinding process efficiency and productivity.

Implementation Method 1

dropping a liquid resin that can be cured by an external stimulus onto a surface of the second protective sheet

Methodology Applied
Scientific EffectCuring: Photopolymerisation

Data Source

PatentUS20240258149A1Method of laying protective sheet and protective sheet
Publication Date: 2024.08.01 DISCO CORP
  • US20240258149A1 patent drawing
  • US20240258149A1 patent drawing
  • US20240258149A1 patent drawing

AI summary

A method of laying a protective sheet on a face side of a wafer includes preparing a first protective sheet having, on one surface thereof, a non-adhesive portion to be coextensive with a device region of the wafer and an adhesive portion to be positioned along an outer circumferential excessive region of the wafer, affixing the one surface of the first protective sheet to the face side of the wafer, dropping a liquid resin onto a surface of a second protective sheet that has surface irregularities ranging from Ra 0.2 to 7 μm and is free of an adhesive layer, bringing another surface of the first protective sheet into facing relation to the surface of the second protective sheet onto which the liquid resin has been dropped, and curing the liquid resin.