Wafer Stage Cable Rail Support to Reduce EUV Particle Generation
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Solution Overview
Problem
EUV lithography apparatuses produce particles due to collisions and abrasions between moving components, leading to wafer contamination and reduced yield.
Innovation Solution
A lithography apparatus design featuring a wafer stage with a cable system supported by rails and sliding members with magnetic areas, allowing wheels to roll along curved tracks with alternating magnetic polarities, maintaining a bent state and preventing sagging and twisting of cables.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a cable system is used to move with the wafer stage, then the wafer stage can be moved to form patterns, but particles are produced due to collision or abrasion between units connected to each other during stage operation
Solution Approach 1:
The patent replaces traditional mechanical support structures with a magnetic field-based support system. Magnets are embedded in the cable and corresponding magnetic sensors detect their positions, allowing the cable to be supported without direct mechanical contact. This eliminates collision and abrasion between mechanical components, thereby reducing particle production while maintaining wafer stage movement capability.
Solution Approach 2:
The patent introduces magnetic fields as an intermediary between the cable and the support structure. Instead of direct mechanical contact, the magnetic field acts as a mediator to support and position the cable during wafer stage movement, preventing mechanical wear and particle generation while enabling smooth operation.
2Stability of the object's composition
If traditional mechanical support is used for the cable, then the cable can be supported, but collision and abrasion occur between connected units during stage operation
Solution Approach 1:
The patent replaces traditional mechanical support structures with a magnetic field-based support system. Magnets are embedded in the cable and corresponding magnetic sensors detect their positions, allowing the cable to be supported without direct mechanical contact. This eliminates collision and abrasion between mechanical components, thereby reducing particle production while maintaining wafer stage movement capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Reduces particle production during stage movement, enhancing product yield and maintaining data transmission integrity.
Implementation Method 1
the first surface of the first rail includes a first magnetic area, a second magnetic area spaced apart from the first magnetic area, and a third magnetic area between the first magnetic area and the second magnetic area, wherein the third magnetic area includes a third S pole area vertically overlapping the first N pole area of the first wheel, and a third N pole area vertically overlapping the first S pole area of the first wheel
Data Source
AI summary
A lithography apparatus comprises a wafer stage, a cable configured to be bent as the wafer stage moves, a first support configured to prevent the cable from sagging, and to support the cable to maintain a bent state of the cable when the cable moves, a first rail installed on a first side of the cable, and including curved track extending in a direction from a lower portion of the cable toward an upper portion of the cable, wherein the first rail includes a concave first surface, a second rail installed on a second side of the cable opposite the first side of the cable, and including curved track extending in the direction from the lower portion of the cable toward the upper portion of the cable, wherein the second rail includes a concave second surface.