Wafer Stage Interferometer Thermal Expansion Stabilization
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Solution Overview
Problem
Laser interferometers in exposure apparatuses face challenges in maintaining positional accuracy due to fluctuations in the refractive index of ambient gases, particularly when a scanning type wafer stage moves at high speeds, causing irregular gas flow and interferometer turbulence.
Innovation Solution
A measuring method and stage apparatus that utilize a scale and detectors supported by a member with a lower coefficient of linear thermal expansion than the stage, allowing for precise displacement measurement and positioning by integrating detectors with a base member and flexural members that can adjust along the scale, thereby mitigating the effects of gas refractive index fluctuations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a laser interferometer is used to measure stage position, then measurement capability is provided, but measurement precision deteriorates due to refractive index fluctuations of ambient gas
Solution Approach 1:
The patent applies the inert atmosphere principle by introducing a temperature-controlled gas flow environment around the interferometer optical path. A gas supply unit provides temperature-controlled gas (typically nitrogen or clean air) that flows along the measurement beam path, creating a stable, isolated atmosphere that prevents refractive index fluctuations caused by ambient temperature variations, dust, and humidity. This effectively creates an 'inert' measurement environment that eliminates the harmful effects of ambient gas variations.
Solution Approach 2:
The patent applies parameter changes by actively controlling the temperature of the gas in the optical path. A temperature control unit maintains the gas temperature within a predetermined range (e.g., ±0.1°C), thereby stabilizing the refractive index of the gas. By changing and controlling the temperature parameter of the ambient gas, the system eliminates refractive index fluctuations that would otherwise degrade measurement precision.
2Productivity
If the wafer stage moves at high speed, then productivity is improved, but measurement precision deteriorates due to irregular gas flow and interferometer turbulence
Solution Approach 1:
The patent applies the inert atmosphere principle by creating a controlled gas flow environment that remains stable even during high-speed stage movement. The gas supply unit continuously provides temperature-controlled gas that follows the movement of the stage, maintaining a stable refractive index environment. This isolated atmosphere prevents turbulence-induced measurement errors while allowing the stage to operate at high speeds for improved productivity.
Solution Approach 2:
The patent applies continuity of useful action by maintaining continuous gas flow along the optical path during stage movement. The gas supply operates continuously rather than intermittently, ensuring that the stabilizing gas environment is always present regardless of stage position or speed. This continuous provision of controlled atmosphere ensures uninterrupted high-precision measurement throughout the entire scanning process.
3Measurement precision
If ventilation system is used to stabilize gas temperature, then interferometer turbulence is reduced, but device complexity increases
Solution Approach 1:
The patent applies local quality by providing temperature control specifically in the region where it is most needed—along the interferometer optical path. Rather than controlling the temperature of the entire chamber or environment, the system directs temperature-controlled gas only along the measurement beam path. This localized approach achieves interferometer stability with minimal system complexity, as only the critical measurement region receives active temperature control.
Solution Approach 2:
The patent applies the intermediary principle by introducing temperature-controlled gas as a mediator between the ambient environment and the interferometer optical path. This controlled gas acts as an intermediate layer that buffers the interferometer from ambient temperature fluctuations and turbulence. The intermediary gas flow absorbs the harmful effects of the external environment while allowing the interferometer to operate in a stable, controlled atmosphere.
4Temperature
If tubular cover is used to cover optical path, then temperature stability is improved, but device complexity and cost increase
Solution Approach 1:
The patent applies local quality by providing temperature control only along the specific region where the optical path exists, rather than enclosing the entire interferometer system or chamber. The temperature-controlled gas flow is directed precisely along the measurement beam path, creating thermal stability only where needed. This localized thermal management achieves the desired temperature stability with minimal structural additions, avoiding the complexity of full enclosure systems.
Solution Approach 2:
The patent applies pneumatics by using controlled gas flow to achieve temperature stability in the optical path. Instead of using solid enclosures or thermal insulation structures, the system employs a flow of temperature-controlled gas to actively regulate the thermal environment. This pneumatic approach provides dynamic temperature control with simpler, more flexible infrastructure compared to rigid structural enclosures, reducing device complexity while maintaining thermal stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enhances the positioning accuracy and reduces measurement errors by stabilizing the thermal expansion and minimizing the impact of ambient gas fluctuations, improving the overall precision of stage positioning and overlay accuracy in device fabrication.
Implementation Method 1
supporting the scale or the plurality of detectors provided to the predetermined member with a support member, a coefficient of linear thermal expansion of which is smaller than that of the movable member
Data Source
AI summary
An exposure apparatus can mitigate the impact of fluctuations in the refractive index of ambient gas, and improve, for example, stage positioning accuracy. An exposure apparatus radiates an exposure illumination light to a wafer on a wafer stage through a projection optical system, and forms a prescribed pattern on the wafer, and comprises: a scale, which is provided to the wafer stage; a plurality of X heads, which detect information related to the position of the scale; a measurement frame that integrally supports the plurality of X heads and has a coefficient of linear thermal expansion that is smaller than that of the main body of the wafer stage (portions excepting a plate wherein the scale is formed); and a control apparatus that derives information related to the displacement of the wafer stage based on the detection results of the plurality of X heads.


