Wafer Stepped Portion Height Measurement for Cutting Edge Wear Detection

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Solution Overview

Problem

The existing cutting apparatuses face challenges in maintaining the quality of the stepped portions on wafers due to wear at the cutting edge, leading to height variations and insufficient depth removal, especially at the inner circumferential portion of the stepped portion.

Innovation Solution

A measuring method and apparatus that measure the height of the upper surface of the stepped portion on wafers by holding the wafer undersurface and using a measuring unit to assess the height at multiple positions along the outer circumference, ensuring accurate height distribution measurements.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If edge trimming processing is repeatedly performed by a cutting blade, then productivity is improved, but manufacturing precision deteriorates due to cutting edge wear causing height variations and curved surfaces

Engineering Contradiction:
Improverepeated edge trimming capabilityVSAvoidstepped portion surface quality
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The system measures the height of the upper surface of the stepped portion at multiple positions and provides feedback information about the cutting edge state. This feedback mechanism allows the system to detect wear conditions and determine when blade replacement or reconditioning is needed, maintaining precision over repeated operations.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent replaces direct mechanical measurement of cutting edge geometry with optical or non-contact measurement of the stepped portion height. This substitution allows for precise detection of cutting quality without mechanical contact, enabling better monitoring of wear effects.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Measurement precision

If measurement is performed at a single position, then measurement precision is improved, but reliability deteriorates because it cannot detect height variations across the stepped portion

Engineering Contradiction:
Improveheight measurement accuracyVSAvoidcutting edge state assessment
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The measurement process is segmented into multiple measurement positions across the stepped portion. By dividing the measurement task into multiple locations, the system comprehensively assesses height variations and provides a complete picture of cutting edge performance.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The measurement system is designed to measure at multiple positions with the same measuring unit, making it universally applicable for detecting various cutting edge conditions including wear, vibration marks, and surface irregularities across the entire stepped portion.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250196385A1Measuring method, measuring apparatus, and workpiece processing method
Publication Date: 2025.06.19 DISCO CORP
  • US20250196385A1 patent drawing
  • US20250196385A1 patent drawing
  • US20250196385A1 patent drawing

AI summary

A measuring method for measuring a height of an upper surface of a stepped portion provided to an outer circumference on a top surface side of a measurement target object includes a holding step of holding an undersurface side of the measurement target object by a holding table such that the stepped portion is exposed upward, and a measuring step of measuring the height of the upper surface of the stepped portion by a measuring unit, a width of a measurement region on the upper surface of the stepped portion to be measured by the measuring unit in one time of measurement being smaller than a width of the stepped portion, and in the measuring step, the height of the upper surface of the stepped portion is measured at a plurality of measurement positions having different distances from the outer circumference of the measurement target object.