Semiconductor Wafer Storage Nozzle Fluid Distribution
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Solution Overview
Problem
Semiconductor wafers face challenges during storage due to oxidation and contamination risks, requiring effective fluid management to maintain a controlled environment.
Innovation Solution
A semiconductor wafer storage system incorporating a container with a coupling plate and nozzle parts for efficient inert gas supply and exhaust, utilizing multiple nozzles for uniform fluid distribution and a controller for precise flow rate control to minimize fluid consumption and prevent oxidation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If multiple nozzles are used for fluid supply, then fluid distribution uniformity is improved, but device complexity increases
Solution Approach 1:
The nozzle part is divided into multiple nozzles (first nozzle, second nozzle, third nozzle) positioned at different locations on the coupling plate. Each nozzle independently supplies fluid to different regions of the container, achieving uniform fluid distribution throughout the storage space while protecting wafers from oxidation and contamination
2Loss of substance
If fluid flow rate is precisely controlled, then fluid consumption is reduced, but control system complexity increases
Solution Approach 1:
The controller receives feedback signals from flow meters that measure the actual flow rate of fluid supplied to the container. Based on this feedback, the controller adjusts the flow rate control valve to maintain optimal fluid consumption, ensuring precise control while preventing wafer oxidation during storage
3Reliability
If inert gas is supplied to prevent oxidation, then wafer protection is improved, but fluid consumption increases
Solution Approach 1:
Inert gas (such as nitrogen) is supplied through multiple nozzles into the container to create an inert atmosphere that prevents oxidation and contamination of semiconductor wafers during storage. The controller precisely manages the inert gas flow rate based on feedback from flow meters, maintaining protective atmosphere while minimizing gas consumption
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively reduces fluid usage and costs by optimizing fluid distribution and flow rates, maintaining a controlled environment that prevents wafer oxidation and contamination, thereby enhancing storage efficiency and yield.
Implementation Method 1
a first nozzle and a second nozzle... to provide the inert gas in the wafer container
Implementation Method 2
an exhaust hole adjacent one of the corners of the coupling plate to exhaust the inert gas in the wafer container
Implementation Method 3
maintaining a controlled environment that prevents wafer oxidation and contamination
Data Source
AI summary
A semiconductor wafer storage system includes a container that provides a space in which a semiconductor wafer is to be stored, a fluid supply that provides a fluid to the container, a connection part that receives the fluid from the fluid supply and transfers the fluid to the container, and a nozzle part that connects the connection part to the container. The container may include a coupling plate to which the nozzle part is coupled, and the nozzle part may include a first nozzle and a second nozzle.