Wafer Observation Device Versatile Template Generation
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing wafer observation devices require users to register multiple template images for different manufacturing processes and types of wafers, leading to increased user burden due to variations in alignment mark appearances.
Innovation Solution
A wafer observation device with a versatile template generation unit that creates a common template image by analyzing similarity levels between alignment images and template images, allowing for successful matching across various processes and types, reducing user registration burden.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a template matching method is used with process-specific template images, then alignment accuracy is improved, but user burden increases due to the need to register multiple templates
Solution Approach 1:
The patent creates a universal template image that can be used across multiple manufacturing processes and wafer types. Instead of requiring separate templates for each process, the system generates a single template that adapts to different alignment mark appearances, thereby reducing user burden while maintaining alignment accuracy through its ability to handle variations in alignment mark external appearances
Solution Approach 2:
The system creates a representative template image that captures the essential features of alignment marks across different processes. This template serves as a copy or model that can be reused universally, eliminating the need for users to manually register multiple process-specific templates while still achieving accurate alignment through the template's generalized representation
2Reliability
If multiple template images are registered for different processes, then alignment reliability is improved, but device complexity increases
Solution Approach 1:
The patent reduces device complexity by implementing a universal template generation system that eliminates the need for managing multiple process-specific templates. The single template approach simplifies the template management structure while maintaining alignment reliability through the template's ability to adapt to various alignment mark appearances across different manufacturing processes
Solution Approach 2:
The system merges the functionality of multiple process-specific templates into a single universal template. By combining the essential features of alignment marks from different processes into one template image, the system simplifies template management and reduces the complexity of having to maintain separate templates for each process while preserving alignment reliability
3Measurement precision
If process-specific template registration is required, then matching precision is improved, but time consumption increases
Solution Approach 1:
The patent performs preliminary action by automatically generating a universal template image that pre-empts the need for process-specific template registration. This preliminary template creation captures the essential features needed for accurate matching across all processes, thereby eliminating the time-consuming manual template registration step while maintaining matching precision through the template's generalized representation
Data Source
AI summary
A versatile template generation unit cuts a first region in which a similarity level to a template image is a first similarity level and a second region in which the similarity level to the template image is a second similarity level different from the first similarity level, from an input image including an alignment mark, to generate a versatile template image.