Wafer Movement Tracking Graphs for Parser-Free Log Analysis

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Solution Overview

Problem

The pre-processing of machine log files for semiconductor manufacturing processes is time-consuming and varies significantly across machines, hindering efficient optimization of manufacturing processes due to the need for Parser program development, which prolongs project timelines.

Innovation Solution

An analysis method and device utilizing graphics processing technology to analyze semiconductor manufacturing processes without requiring Parser programs, enabling automatic loading and processing of machine log files through a graphics interface, generating wafer movement tracking graphs to identify bottlenecks and optimize processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If Parser program development is used to process machine log files, then data processing accuracy is improved, but project timeline is extended by 2 to 3 months

Engineering Contradiction:
Improvedata processing accuracyVSAvoidproject timeline
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent creates a visual copy of the manufacturing process through wafer movement tracking graphs that replicate the actual process flow, machine actions, and timing information. This visual representation serves as an alternative to traditional Parser programs, enabling analysts to understand and optimize processes without extensive programming development

Inventive Principle:
Principle #26Copying

Solution Approach 2:

The patent replaces the mechanical system of Parser program development with a graphical user interface-based system. Instead of requiring programmers to write and debug code, the system uses visual drag-and-drop operations and automatic graph generation to achieve the same data processing and analysis goals

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Productivity

If custom Parser programs are developed for each machine, then data processing capability is improved, but device complexity increases

Engineering Contradiction:
Improvedata processing capabilityVSAvoidsystem complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent creates a universal system that can process log files from multiple different machine types through a single graphical interface. The wafer movement tracking graph technology serves multiple functions: visualizing process flow, identifying bottlenecks, analyzing timing, and generating optimization insights, eliminating the need for separate Parser programs for each machine type

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The system performs automatic processing of machine log files through the graphical interface, eliminating the need for manual Parser program development. The automatic generation of wafer movement tracking graphs from raw log data represents a self-service capability that reduces both time and complexity requirements

Inventive Principle:
Principle #25Self-service

3Measurement precision

If detailed pre-processing treatment is applied to machine log files, then analysis accuracy is improved, but work amount increases to 70 to 80% of total project

Engineering Contradiction:
Improveanalysis accuracyVSAvoidwork efficiency
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent performs preliminary organization of log file data into structured formats that automatically generate wafer movement tracking graphs. By pre-structuring the data in a standardized format during the loading phase, the system eliminates the need for extensive pre-processing treatment later, reducing the 70-80% work burden while maintaining analysis accuracy

Inventive Principle:
Principle #10Preliminary action

Data Source

PatentUS20250246463A1Analysis method and analysis device for semiconductor manufacturing process
Publication Date: 2025.07.31 UNITED MICROELECTRONICS CORP
  • US20250246463A1 patent drawing
  • US20250246463A1 patent drawing
  • US20250246463A1 patent drawing

AI summary

An analysis method and an analysis device for a semiconductor manufacturing process are provided. The analysis method of the semiconductor manufacturing process includes the following steps. A semiconductor machine log file is loaded. A plurality of machine action events are defined from the semiconductor manufacturing machine log file. A wafer moving path map is generated according to a wafer moving information file. A plurality of account point information are bound to each of the machine action events according to the wafer moving path map. A wafer movement tracking graph is generated according to the machine action events that have been bound to account information.