Wafer Transfer Layout for Compact Epitaxial Reactor Loading

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Solution Overview

Problem

Existing epitaxial reactors have a large footprint due to the need for a multi-articulated wafer handling robot and a reaction chamber that requires a minimum length to accommodate the end effector for wafer loading and unloading.

Innovation Solution

A wafer loading and unloading system that incorporates a linear actuator and a handling robot with an articulated arm of reduced length, allowing for a smaller footprint by positioning multiple reaction chambers in a radial arrangement and using a fork-like transport device to move wafers directly along a translation axis.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If a multi-articulated wafer handling robot with an end effector is used to load and unload wafers from the reaction chamber, then the wafer loading and unloading function is achieved, but the footprint of the epitaxial reactor becomes large

Engineering Contradiction:
Improvewafer loading and unloading functionVSAvoidfootprint of epitaxial reactor
Core Design Contradiction:
Ease of operationVSArea of stationary object

Solution Approach 1:

The system separates the wafer handling function into two independent parts: a linear actuator that moves wafers along a translation axis, and a handling robot that performs loading and unloading operations. This segmentation allows each component to be optimized independently, reducing the overall footprint while maintaining full functionality.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent introduces a linear actuator that moves wafers along a translation axis perpendicular to the reaction chamber axis, adding a new dimensional approach to wafer delivery. This allows the handling robot to operate from a different spatial configuration, reducing the radial space required and enabling a more compact overall design.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If the reaction chamber and end effector are designed with minimum required lengths to meet production requirements, then the production yield requirements are satisfied, but the footprint cannot be reduced further

Engineering Contradiction:
Improveproduction yieldVSAvoidfootprint of epitaxial reactor
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The system employs a movable linear actuator that can dynamically adjust the position of wafers along the translation axis. This dynamic positioning capability allows the reaction chamber length to be minimized while still accommodating the necessary production requirements, as the actuator can extend or retract to provide the required working length only when needed.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The linear actuator is positioned such that its movement space is nested within the overall reactor footprint, allowing the effective working length to be greater than the physical footprint dimensions. The actuator can extend into the reaction chamber space during operation, eliminating the need for a permanently large reaction chamber length.

Inventive Principle:
Principle #7Nested doll (Nesting)

3Area of stationary object

If multiple reaction chambers are arranged radially around a single handling robot to reduce footprint, then space utilization improves, but the footprint reduction goal is not achieved

Engineering Contradiction:
Improvefootprint of epitaxial reactorVSAvoidradial arrangement complexity
Core Design Contradiction:
Area of stationary objectVSDevice complexity

Solution Approach 1:

The handling robot is designed with multi-functionality to perform both wafer loading into the reaction chamber and unloading from it, as well as transferring wafers to and from the linear actuator. This universal capability eliminates the need for separate specialized robots for each function, reducing overall system complexity despite the radial arrangement.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Data Source

PatentUS20250038027A1Wafer loading and unloading system for an epitaxial reactor and an epitaxial reactor
Publication Date: 2025.01.30 LPE SPA
  • US20250038027A1 patent drawing
  • US20250038027A1 patent drawing
  • US20250038027A1 patent drawing

AI summary

A system for loading and unloading wafers into a reaction chamber of an epitaxial reactor, the system comprising a handling robot; a linear actuator, extended along a translation axis, wherein the handling robot is configured to transfer a wafer to the linear actuator, and wherein the linear actuator is configured to receive the wafer from the handling robot and to move the wafer along the translation axis so as to place the wafer inside the reaction chamber.