Wafer Transfer Layout Using a Linear Actuator to Shrink Reactor Footprint

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Solution Overview

Problem

Existing epitaxial reactors have a large footprint due to the need for a long reaction chamber and end effector to accommodate wafer loading and unloading within the intense heat of the reaction chamber, limiting the reduction of overall dimensions.

Innovation Solution

A wafer loading and unloading system that incorporates a linear actuator and a handling robot with a reduced-length articulated arm, allowing for a smaller footprint by enabling the use of shorter end effectors and reducing the size of the handling chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of operation

If a multi-articulated robotic arm is used for wafer handling, then wafer loading and unloading can be performed, but the system footprint becomes large due to the need for long reaction chamber and end effector

Engineering Contradiction:
Improvewafer loading and unloading capabilityVSAvoidsystem footprint
Core Design Contradiction:
Ease of operationVSArea of stationary object

Solution Approach 1:

The system divides the wafer handling function into two separate components: a handling robot for wafer transfer and a linear actuator for precise positioning and insertion. This segmentation allows each component to be optimized independently, reducing the overall footprint compared to a single multi-articulated robotic arm that would require longer reach and more complex joint mechanisms

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The linear actuator serves as an intermediary between the handling robot and the reaction chamber. The robot transfers wafers to the linear actuator, which then performs the precise positioning and insertion into the reaction chamber. This intermediary approach eliminates the need for the robot arm to directly reach into the chamber, allowing for shorter arm length and reduced footprint

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If the reaction chamber and end effector are made long enough to accommodate wafer transfer operations, then proper wafer handling is ensured, but the overall dimensions of the epitaxial reactor increase

Engineering Contradiction:
Improvewafer transfer reliabilityVSAvoidreaction chamber length
Core Design Contradiction:
ReliabilityVSLength of stationary object

Solution Approach 1:

The wafer transfer path is segmented into two distinct stages: transfer by the handling robot and insertion by the linear actuator. This allows the reaction chamber to be shorter because the linear actuator performs the final insertion from a position closer to the chamber opening, rather than requiring a long end effector to reach from the robot's base position

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The system transitions from a single-dimensional robotic arm reaching into the chamber to a two-stage process where the linear actuator extends the working range in the axial direction. This dimensional change allows for shorter radial reach requirements, reducing the overall chamber length while maintaining reliable wafer transfer

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Data Source

PatentEP4498415A1Wafer loading and unloading system for an epitaxial reactor and an epitaxial reactor
Publication Date: 2025.01.29 LPE SPA
  • EP4498415A1 patent drawingFigure 1~2
  • EP4498415A1 patent drawingFigure 3~4
  • EP4498415A1 patent drawingFigure 5~6

AI summary

SUMMARY A system (1) for loading and unloading wafers (2) into a reaction chamber (3) of an epitaxial reactor (4), the system (1) comprising a handling robot (5); a linear actuator (6), extended along a translation axis (7), wherein the handling robot (5) is configured to transfer a wafer (2) to the linear actuator (6), and wherein the linear actuator (6) is configured to receive the wafer (2) from the handling robot (5) and to move the wafer (2) along the translation axis (7) so as to place the wafer (2) inside the reaction chamber (3).