Wafer Transfer Control Macros for Plasma Cluster Tools
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Solution Overview
Problem
The complex and error-prone process of transferring wafers within a plasma cluster tool environment, requiring skilled users to input multiple parameters and navigate multiple intermediate locations, increases the likelihood of errors and can lead to equipment damage during emergency situations like power outages.
Innovation Solution
A computer-implemented method that allows users to create wafer transfer instructions by identifying only the origination and destination wafer-holding locations, with the system automatically generating the necessary instructions and determining the optimal path, using a drag-and-drop interface or minimal user input, and employing a breadth-first traversal algorithm to ensure efficient and error-free wafer movement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If users manually create wafer transfer instructions by inputting multiple parameters and navigating intermediate locations, then the system provides flexibility and control over wafer movement, but the complexity of the operation increases and user errors become more likely
Solution Approach 1:
The system performs self-service by automatically generating wafer transfer instructions based on selected source and destination locations. The computer determines the optimal path and creates the necessary transfer command sequences without requiring manual input of intermediate locations, robot effector selections, or pressure chamber parameters, thereby reducing user error while maintaining operational flexibility
Solution Approach 2:
The system performs preliminary actions by pre-calculating and storing optimal transfer paths between all possible wafer-holding locations. When a user selects a source and destination, the system retrieves and executes the pre-determined transfer sequence, eliminating the need for users to manually plan and input each intermediate step during the actual wafer transfer operation
2Adaptability or versatility
If users are required to input multiple parameters including intermediate wafer-holding locations and robot effector selections, then the transfer process can be customized and optimized, but the time required to create transfer instructions increases
Solution Approach 1:
The system performs preliminary calculations to determine optimal transfer paths between all possible wafer-holding locations before actual operation. These pre-computed paths are stored and can be quickly retrieved when needed, allowing the system to provide customized and optimized transfer routes without requiring users to spend time manually planning each transfer sequence
Solution Approach 2:
The system replaces the manual mechanical process of creating transfer instructions with an automated computer-based system. The computer algorithm automatically determines the optimal path and generates transfer commands, substituting human manual input and decision-making with automated computational processes that are both faster and equally adaptable to different transfer scenarios
3Ease of operation
If the system provides a menu-driven interface with graphical overview for creating transfer instructions, then users can visualize and control the wafer movement process, but the number of steps and parameters to input increases the likelihood of errors
Solution Approach 1:
The system performs self-service by automatically generating the complete transfer instruction sequence based on the user's selection of source and destination locations. The computer retrieves pre-computed optimal paths and automatically creates the necessary commands, eliminating manual input of intermediate parameters that could lead to errors while preserving the visual interface for user control and monitoring
4Manufacturing precision
If users must navigate through multiple intermediate wafer-holding locations and select appropriate robot effectors, then the transfer process can be precisely controlled, but the skill level required from users increases
Solution Approach 1:
The system performs self-service by automatically determining the optimal transfer path and selecting the appropriate robot effector based on the source and destination locations. The computer retrieves pre-computed transfer sequences that include all necessary intermediate steps and effector selections, maintaining precise control over the wafer transfer process while eliminating the need for users to possess specialized knowledge of the system's internal operations
Data Source
AI summary
A computer-implemented method for creating a set of wafer transfer instructions configured to transfer a wafer between an origination wafer-holding location and a destination wafer-holding location in a plasma cluster tool, which has a plurality of wafer-holding locations. The method includes receiving a first user-provided location indicator and a second user-provided location indicator, which graphically identify the origination wafer-holding location and the destination wafer-holding location respectively on the on-screen graphical representation of the plasma cluster tool. The method further includes ascertaining data pertaining to a path between the first user-provided location indicator and the second user-provided location indicator. The method further includes forming the set of wafer transfer instructions responsive to the data pertaining to the path. The set of wafer transfer instructions is configured to transfer the wafer along a set of wafer-holding locations associated with the path.


