Wafer Transfer Stability After Peripheral Reinforcing Portion Removal

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Solution Overview

Problem

Thinned semiconductor wafers are difficult to handle due to reduced rigidity, leading to cracking and instability during processing, especially when transferring from a peripheral reinforcing portion removal process to chip division, as conventional methods lack reliable damage-free transfer solutions.

Innovation Solution

A processing method and apparatus that involves removing the projection of the peripheral reinforcing portion while holding the wafer on a table, applying a holding tape supported by a frame, and transferring the wafer with the frame to ensure stable handling and prevent damage during the transfer to the next process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Length of moving object

If the wafer is thinned to reduce semiconductor wafer thickness, then compactness and thinness of electronic apparatus are improved, but rigidity of the semiconductor wafer is decreased making it difficult to handle and prone to cracking

Engineering Contradiction:
Improvethickness of semiconductor waferVSAvoidrigidity of semiconductor wafer
Core Design Contradiction:
Length of moving objectVSStrength

Solution Approach 1:

The invention applies local quality by creating a peripheral reinforcing portion with greater thickness only at the peripheral region of the wafer, while maintaining thin thickness in the central device region. This localized thickness variation provides enhanced rigidity at the periphery for handling stability without compromising the overall thinness requirement for compact electronic apparatus.

Inventive Principle:
Principle #3Local quality

2Strength

If a protective tape is applied to provide rigidity to the thinned wafer, then rigidity is improved, but heat-resistance is insufficient requiring lower processing temperature and more time-consuming processing

Engineering Contradiction:
Improverigidity of thinned waferVSAvoidprocessing temperature
Core Design Contradiction:
StrengthVSTemperature

Solution Approach 1:

The peripheral reinforcing portion provides localized rigidity enhancement without requiring protective tape. The inherent structural rigidity from the thicker peripheral region allows the wafer to withstand processing temperatures without the thermal limitations imposed by protective tape, enabling higher temperature processing and reduced processing time.

Inventive Principle:
Principle #3Local quality

3Ease of operation

If the peripheral reinforcing portion is removed to allow stable holding on chuck table, then ease of operation is improved, but rigidity is reduced making damage more likely during transfer

Engineering Contradiction:
Improveholdability on chuck tableVSAvoidrigidity of wafer
Core Design Contradiction:
Ease of operationVSStrength

Solution Approach 1:

The invention applies dynamics by making the holding table surface conformable to match the recessed rear surface shape of the wafer with peripheral reinforcing portion. This dynamic adaptation of the holding surface allows stable vacuum holding of wafers with non-planar rear surfaces, eliminating the need to remove the peripheral reinforcing portion while maintaining both holdability and rigidity.

Inventive Principle:
Principle #15Dynamics

4Ease of manufacture

If the wafer is held on holding table with rear surface exposed for peripheral reinforcing portion removal, then accessibility for processing is improved, but stable holding becomes difficult when peripheral reinforcing portion is present

Engineering Contradiction:
Improveaccessibility of rear surfaceVSAvoidstability of holding
Core Design Contradiction:
Ease of manufactureVSEase of operation

Solution Approach 1:

The holding table surface is designed to be conformable, allowing it to adapt its shape to match the recessed rear surface of the wafer with peripheral reinforcing portion. This dynamic conformability maintains full contact between the holding table and wafer rear surface, providing stable vacuum holding while preserving complete accessibility of the rear surface for peripheral reinforcing portion removal processing.

Inventive Principle:
Principle #15Dynamics

Data Source

PatentUS7858530B2Processing method for wafer and processing apparatus therefor
Publication Date: 2010.12.28 DISCO CORP
  • US7858530B2 patent drawing
  • US7858530B2 patent drawing
  • US7858530B2 patent drawing

AI summary

A processing method for a wafer includes: preparing a wafer which has a device region having plural devices formed on a surface of the wafer; and a peripheral reinforcing portion which is integrally formed around the device region and has a projection projecting outwardly on a rear surface of the wafer. The processing method further includes: removing at least the projection of the peripheral reinforcing portion of the wafer; and transferring the wafer after the removing. In the removing, while the wafer is held on a holding table such that the rear surface of the wafer is exposed and the surface of the wafer closely contacts the holding table, at least the projection of the peripheral reinforcing portion is removed. After the removing of at least the projection, while the wafer is held on the holding table, a holding tape is applied to the rear surface of the wafer and the holding tape is supported by a frame. In the transferring, the wafer having the holding tape applied thereon is separated together with the frame from the holding table and is transferred together with the frame.