Warped Substrate Transfer Using Oblique Alignment Loading

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Solution Overview

Problem

Substrates in substrate processing systems may exhibit warpage, which complicates accurate alignment and transfer, leading to potential positional displacement and particle generation during handling.

Innovation Solution

A method involving a transfer robot that obliquely mounts substrates in an alignment module, measuring eccentricity to estimate warpage, and correcting positional displacement based on this measurement to ensure accurate loading in subsequent modules.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a substrate with warpage is transferred using a conventional horizontal mounting method, then the transfer process is simple, but the substrate experiences positional displacement and particle generation due to warpage

Engineering Contradiction:
Improvetransfer accuracyVSAvoidmounting operation complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent changes the mounting operation from a horizontal approach to an oblique downward movement, introducing a vertical dimension to the transfer path. This dimensional change allows the substrate to be mounted while accommodating its warpage, preventing positional displacement and particle generation without requiring complex additional equipment

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Manufacturing precision

If the substrate is mounted horizontally without considering warpage, then the mounting process is fast, but alignment precision deteriorates due to positional displacement

Engineering Contradiction:
Improvealignment precisionVSAvoidmeasurement and correction time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent performs preliminary measurement of substrate eccentricity before the mounting operation. By measuring the eccentricity and calculating the required correction amount in advance, the system prepares the corrected transfer path beforehand, ensuring alignment precision is maintained while minimizing additional time loss during the actual mounting process

Inventive Principle:
Principle #10Preliminary action

3Object-generated harmful factors

If conventional transfer methods are used for substrates with warpage, then the transfer process is straightforward, but particle generation occurs due to improper handling of warped substrates

Engineering Contradiction:
Improveparticle generationVSAvoidtransfer operation simplicity
Core Design Contradiction:
Object-generated harmful factorsVSEase of operation

Solution Approach 1:

The patent replaces the conventional horizontal mechanical transfer path with an oblique downward transfer path. This mechanical substitution changes the relative motion between the transfer robot and substrate, allowing the substrate to be mounted in a manner that accommodates its warpage shape, thereby preventing particle generation while maintaining operational simplicity

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Data Source

PatentUS20250279301A1Substrate transfer method and substrate processing system
Publication Date: 2025.09.04 TOKYO ELECTRON LTD
  • US20250279301A1 patent drawing
  • US20250279301A1 patent drawing
  • US20250279301A1 patent drawing

AI summary

A substrate transfer method includes (A) causing a transfer robot to hold a substrate and to load the substrate in an alignment module, and causing the transfer robot to mount the substrate on a stage of the alignment module based on the transfer robot moving past the stage of the alignment module; (B) causing the alignment module to measure an eccentricity of the substrate and estimating an amount of warpage of the substrate based on the measured eccentricity of the substrate; and (C) causing the substrate unloaded from the alignment module to be loaded in a different module based on the estimated amount of warpage of the substrate. The (A), (B), and (C) are performed in this order. In (A), the substrate is moved obliquely downward relative to a stage of the alignment module.