Washing Apparatus Gas Nozzle Ceiling Droplet Control
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Solution Overview
Problem
In semiconductor substrate processing, droplets containing contaminants can fall from the ceiling of a washing apparatus onto the substrate due to disorderly splashing back of washing liquid and humidity, leading to contamination.
Innovation Solution
A washing apparatus equipped with a gas nozzle that ejects gas towards the ceiling to move adhered droplets away from the substrate, with a control system to manage the gas ejection based on detection of droplets and adjustable nozzle orientation to prevent contamination, and a drain to direct droplets outside without falling on the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If washing liquid is supplied to the substrate, then the substrate is washed, but droplets containing contaminants fall from the ceiling onto the substrate causing contamination
Solution Approach 1:
A gas nozzle is introduced as an intermediary device that ejects gas toward the ceiling to move adhered droplets away from the substrate. The gas flow acts as a mediator between the washing liquid supply system and the substrate, preventing direct contact between contaminating droplets and the substrate surface.
Solution Approach 2:
The patent replaces mechanical washing systems with a gas-based control system. Instead of using complex mechanical structures to prevent droplet adhesion, a gas ejection system is used to actively move droplets, simplifying the overall system while effectively preventing contamination.
2Reliability
If gas is continuously ejected from the gas nozzle, then droplets are prevented from adhering to the ceiling, but energy consumption increases
Solution Approach 1:
The gas nozzle operates periodically rather than continuously. The control unit activates the gas ejection at predetermined timings or when droplets are detected, allowing the ceiling to remain in a dried state while minimizing energy consumption by keeping the gas ejection system inactive during periods when droplet adhesion is not a risk.
Solution Approach 2:
The system incorporates a detection unit that monitors the ceiling for droplet adhesion and provides feedback to the control unit. This feedback mechanism enables the gas nozzle to be activated only when necessary, optimizing the balance between maintaining a dried ceiling state and conserving energy.
3Device complexity
If the gas nozzle is fixed in orientation, then the structure is simple, but droplets may accumulate in areas not covered by the gas flow
Solution Approach 1:
The gas nozzle is designed with adjustable orientation capabilities, allowing it to dynamically change its direction to target different areas of the ceiling where droplets may accumulate. This dynamic adjustability ensures comprehensive droplet removal effectiveness without requiring an overly complex multi-nozzle system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Prevents droplets with contaminants from falling onto the semiconductor substrate, conserves energy by ejecting gas only when necessary, and ensures effective droplet removal through adjustable nozzle direction and detection mechanisms.
Implementation Method 1
a gas nozzle that ejects a gas toward a ceiling of the housing
Implementation Method 2
a detection part that detects droplets adhered to the ceiling
Implementation Method 3
a drain provided on a bottom surface of the housing. The drain is arranged at a position sandwiching the holding part between the drain and the gas nozzle in a plan view
Data Source
AI summary
A washing apparatus includes: a housing; a holding part that holds a substrate arranged in the housing; a washing nozzle that supplies a washing liquid to the substrate held by the holding part; a gas nozzle that ejects a gas toward a ceiling of the housing; and a control part that controls the gas nozzle.