Water-Soluble Stereolithography Composition for Warping Reduction

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Solution Overview

Problem

Conventional stereolithographic compositions face issues with adhesion of thin cured film layers, warping during production, and require heat treatment for enhanced heat resistance, which increases environmental burden and reduces work efficiency.

Innovation Solution

A water-soluble composition for optical stereolithography comprising a water-soluble cationic polymerizable compound, a radical polymerizable compound, an antimony-free cationic polymerization initiator, and a radical polymerization initiator, along with optional novolac-type epoxy resin and sensitizer, that allows for rapid photo curing without heat treatment, ensuring strong adhesion and improved mechanical properties.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Object-affected harmful factors

If conventional oil-soluble compositions are used for stereolithography, then the composition can be cured to form stereolithographic objects, but organic solvents are required for washing which increases environmental burden and safety concerns

Engineering Contradiction:
Improveenvironmental burden and safetyVSAvoidwashing process complexity
Core Design Contradiction:
Object-affected harmful factorsVSEase of manufacture

Solution Approach 1:

The patent changes the solubility parameter of the composition from oil-soluble to water-soluble by selecting specific polymerizable compounds and initiators with water solubility characteristics. This allows replacement of organic solvents with water in the washing process, eliminating environmental burden and safety concerns while simplifying the manufacturing process.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent converts the potential harm of using water (which might not effectively wash oil-based residues) into a benefit by making the composition itself water-soluble. This transforms water from a potentially inadequate washing medium into an effective washing solution that can dissolve and remove uncured composition residues without requiring harsh organic solvents.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

2Manufacturing precision

If thin cured film layers are formed to create stereolithographic objects, then high resolution can be achieved, but adhesion between layers becomes insufficient leading to poor strength

Engineering Contradiction:
ImproveresolutionVSAvoidlayer adhesion
Core Design Contradiction:
Manufacturing precisionVSStrength

Solution Approach 1:

The patent uses a composite system combining water-soluble cationic polymerizable compounds and water-soluble radical polymerizable compounds with dual polymerization mechanisms. This composite approach enables both thin layer formation for high resolution and strong interlayer adhesion through coordinated cationic and radical polymerization reactions, solving the contradiction between resolution and strength.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent incorporates a water-soluble cationic polymerization initiator that begins cationic polymerization during the UV laser scanning process itself, before the layer is completely formed. This preliminary action ensures strong adhesion between thin layers as they are being deposited, preventing delamination while maintaining high resolution.

Inventive Principle:
Principle #10Preliminary action

3Temperature

If heat treatment is applied to enhance heat resistance of stereolithographic objects, then mechanical properties improve, but work efficiency decreases and environmental burden increases

Engineering Contradiction:
Improveheat resistanceVSAvoidwork efficiency
Core Design Contradiction:
TemperatureVSProductivity

Solution Approach 1:

The patent replaces the thermal field (heat treatment) with a photochemical field (UV laser scanning). By using water-soluble polymerizable compounds and dual polymerization mechanisms, the system achieves high heat resistance and mechanical properties through controlled photopolymerization without requiring subsequent heat treatment steps, thereby maintaining high productivity and reducing environmental burden.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the curing mechanism parameter from thermal curing to photopolymerization. This parameter change allows the stereolithographic objects to achieve high heat resistance and mechanical properties through light-induced polymerization reactions, eliminating the need for post-curing heat treatment and improving work efficiency.

Inventive Principle:
Principle #35Parameter changes

4Ease of manufacture

If conventional cationic polymerization initiators are used, then polymerization can proceed, but toxic antimony compounds are required which pose safety and environmental risks

Engineering Contradiction:
Improvepolymerization capabilityVSAvoidtoxicity
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The patent converts the potential harm of using toxic antimony-based initiators into a benefit by employing water-soluble sulfonium or iodonium salts as alternative cationic initiators. These alternatives not only eliminate toxicity but also provide better water solubility and controlled polymerization characteristics, improving both safety and manufacturing ease.

Inventive Principle:
Principle #22Blessing in disguise (Convert harm into benefit)

Solution Approach 2:

The patent changes the chemical composition parameter of the cationic initiator from antimony-based to sulfur- or iodine-based compounds. This parameter change eliminates the toxicity associated with antimony while maintaining or improving polymerization capability through the use of water-soluble sulfonium or iodonium salts that effectively initiate cationic polymerization of the polymerizable compounds.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The composition enables rapid photo curing with enhanced toughness, heat resistance, and reduced warp deformation, while eliminating the need for heat treatment, thus improving environmental sustainability and production efficiency.

Implementation Method 1

forming and stacking cured layers one by one by curing a photo-curable resin through ultraviolet laser scanning

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Implementation Method 2

containing a water-soluble cationic polymerizable compound and an antimony-free cationic polymerization initiator

Methodology Applied
Scientific EffectCationic polymerization:

Implementation Method 3

containing a radical polymerizable compound and a radical polymerization initiator

Methodology Applied
Scientific EffectRadical polymerization:

Data Source

PatentUS10662278B2Composition for optical stereolithography and method for producing stereolithographic object using the same
Publication Date: 2020.05.26 OKAMOTO KAGAKU KOGYO KK
  • US10662278B2 patent drawing
  • US10662278B2 patent drawing
  • US10662278B2 patent drawing

AI summary

Provided is a water-soluble composition for optical three-dimensional modeling having little burden on the environment, which enables the production of a three-dimensional model that has both little warping deformation and excellent mechanical characteristics, while exhibiting good adhesion between cured film layers during the production process of the three-dimensional model; and a method for producing a three-dimensional model, which uses this composition for optical three-dimensional modeling. Specifically provided is a water-soluble composition for optical three-dimensional modeling, which contains (A) 10-70% by mass of a water-soluble cationically polymerizable compound that is an ether derivative compound of a sorbitol having a glycidyl ether structure, (B) 1-30% by mass of a water-soluble radically polymerizable compound having a methacryl group and/or an acryl group, (C) 0.1-20% by mass of an antimony-free cationic polymerization initiator that is a sulfonium compound or a bis(alkylphenyl)iodonium compound, and (D) 0.1-20% by mass of a radical polymerization initiator.