Wavefront-Guided Lenticule Extraction for Higher-Order Aberration Correction
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Solution Overview
Problem
Existing corneal lenticule extraction procedures lack accuracy and effectiveness in correcting higher-order aberrations during vision correction surgeries.
Innovation Solution
A wavefront-guided corneal lenticule extraction method using wavefront measurements to calculate precise lenticule incisions, incorporating Zernike polynomials and Munnerlyn correction factors to distribute aberration components accurately between bottom and top lenticule surfaces.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional corneal lenticule extraction procedures are used, then the surgical procedure can be performed, but the accuracy and effectiveness in correcting higher-order aberrations is insufficient
Solution Approach 1:
The patent segments the wavefront aberration map into multiple Zernike polynomial components (lower-order, mid-order, and higher-order aberrations). Each component is independently analyzed and corrected through specific lenticule incision patterns, allowing precise targeting of different aberration types rather than treating them as a single unified correction problem.
Solution Approach 2:
The patent applies local quality by creating spatially varying lenticule incision depths and patterns across different regions of the cornea. The incision parameters are locally optimized based on the specific wavefront aberration characteristics at each location, enabling differentiated correction for higher-order aberrations in specific corneal zones.
Solution Approach 3:
The patent performs preliminary wavefront measurement and Zernike polynomial decomposition before the actual lencicule extraction procedure. This pre-planning stage calculates the optimal incision parameters and lenticule removal patterns in advance, guiding the surgical execution to achieve precise higher-order aberration correction.
2Reliability
If standard wavefront-guided procedures are used, then general aberration correction is achieved, but higher-order aberrations are not effectively corrected
Solution Approach 1:
The patent divides the wavefront aberration map into distinct Zernike polynomial order groups (lower-order: 2nd-3rd order, mid-order: 4th-5th order, higher-order: 6th order and above). This segmentation enables independent calculation and precise control of incision parameters for each aberration category, improving the measurement precision of aberration component distribution.
Solution Approach 2:
The patent incorporates feedback by using measured wavefront data to iteratively refine the lenticule incision design. The actual wavefront measurements guide the Zernike decomposition and inform the calculation of optimal incision parameters, creating a closed-loop system that enhances measurement precision and correction effectiveness.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enhances the accuracy and precision of corneal lenticule extraction, effectively correcting higher-order aberrations and improving surgical outcomes.
Implementation Method 1
a pulsed laser beam comprising a plurality of laser pulses... operating the ophthalmic laser system to incise the cornea according to the cutting profiles
Data Source
AI summary
A ophthalmic laser-assisted corneal lenticule extraction procedure that uses wavefront measurements to guide the formation of the corneal lenticule. The wavefront map measured from a free eye using a wavefront aberrometer is registered to the cornea of a docked eye based on comparisons of iris images and corneal markings. The docked-eye cornea-registered wavefront map is then corrected to be consistent with the Munnerlyn formula for the spherical power, and adjusted for any physician adjustments and/or myopia error due to a flat add in the lenticule, using Zernike polynomials. The corrected and adjusted wavefront map is then used to calculate the profiles of the bottom and top lenticule incisions in the applanated cornea, where higher-order components in the wavefront map are distributed to the bottom lenticule incision alone and lower-order components in the wavefront map are distributed to both the bottom and the top lenticule incision.