Optical Wavefront Measuring Device for Aspheric Decentration

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Solution Overview

Problem

Current optical measurement methods, such as probe metrology and Fizeau interferometry with Computer Generated Hologram (CGH), face challenges like surface damage, high costs, and limited dynamic range when measuring aspheric optical surfaces, making it difficult to accurately assess decentration and aberrations in optics under test.

Innovation Solution

An optical wavefront measuring device and method utilizing a rotational spindle, light source module, and wavefront sensor with High Dynamic Range (HDR) imaging to capture camera frames at different exposures, analyzing wavefront phases and ray slopes at various azimuthal directions to determine aberrations and decentration, thereby overcoming alignment errors and limitations of traditional wavefront sensors.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If traditional Fizeau interferometry with CGH is used to measure aspheric optical surfaces, then measurement precision is improved, but device complexity and manufacturing cost increase due to custom CGH design and strict alignment requirements

Engineering Contradiction:
Improvemeasurement precisionVSAvoiddevice complexity
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent uses a standard wavefront sensor to capture and process intensity distribution images, creating a digital representation of the wavefront. Through iterative optimization algorithms, the system reconstructs the wavefront phase information without requiring physical CGH elements, thereby simplifying the measurement system while maintaining precision for aspheric surfaces

Inventive Principle:
Principle #26Copying

Solution Approach 2:

The patent replaces the mechanical/optical CGH alignment system with a computational approach. Instead of physically aligning CGH elements, the system uses image processing and iterative optimization algorithms to achieve wavefront reconstruction, eliminating complex mechanical alignment requirements while maintaining measurement precision

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Use of energy by moving object

If traditional wavefront sensor is used to measure aspheric aberration, then dynamic range is improved compared to interferometry, but measurement precision deteriorates due to limited dynamic range when measuring large aspheric aberrations

Engineering Contradiction:
Improvedynamic rangeVSAvoidmeasurement precision
Core Design Contradiction:
Use of energy by moving objectVSMeasurement precision

Solution Approach 1:

The patent divides the wavefront measurement into multiple intensity distribution images captured at different azimuthal directions. By segmenting the measurement process into multiple directional scans and combining the results through iterative optimization, the system extends the effective dynamic range while maintaining precision for large aspheric aberrations

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent adds the azimuthal direction dimension to the measurement process. Instead of measuring only in the radial direction, the system captures intensity distributions at multiple azimuthal angles, effectively extending the measurement dynamic range by utilizing angular information while maintaining precision through iterative reconstruction

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

3Measurement precision

If probe metrology is used to measure optical surfaces, then measurement precision is improved for surface profile, but reliability deteriorates due to potential surface damage from contact measurement

Engineering Contradiction:
Improvesurface profile measurement precisionVSAvoidreliability
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent replaces contact-based probe metrology with non-contact optical measurement. By using wavefront sensing and intensity distribution analysis, the system achieves surface profile measurement precision without mechanical contact, thereby eliminating the risk of surface damage and improving measurement reliability

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

4Measurement precision

If CGH is used to assist measurement of aspheric optics, then measurement precision is improved, but productivity deteriorates due to time-consuming custom design and manufacturing processes

Engineering Contradiction:
Improvemeasurement precisionVSAvoidproductivity
Core Design Contradiction:
Measurement precisionVSProductivity

Solution Approach 1:

The patent uses standard, off-the-shelf wavefront sensors and optical components instead of custom-designed CGH elements. By copying the wavefront modulation function through computational algorithms rather than physical elements, the system achieves aspheric measurement precision using readily available components, dramatically improving productivity and reducing lead time

Inventive Principle:
Principle #26Copying

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables accurate measurement of aspheric wavefronts with non-uniform light intensity, reduces measurement errors, and provides a cost-effective solution for assessing optical aberrations without the need for custom CGH or null optics, improving measurement precision and flexibility.

Implementation Method 1

a wavefront sensor for acquiring one or more camera frames with different exposures when the optics under test at a plurality of azimuthal directions

Methodology Applied
Scientific EffectHigh Dynamic Range imaging:

Data Source

PatentUS20240085268A1Optical wavefront measuring device and measuring method thereof
Publication Date: 2024.03.14 NAT CENT UNIV
  • US20240085268A1 patent drawing
  • US20240085268A1 patent drawing
  • US20240085268A1 patent drawing

AI summary

A device and method for measuring the decentration of optics under test is provided. The device comprises a rotational spindle for loading and rotating the optics under test, a light source module for providing incident light beam to the optics under test, and a wavefront sensor for receiving testing light beams with different exposures from the optics under test at a plurality of azimuthal directions.