Wavefront Modulator Singularity Pattern Alignment

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Solution Overview

Problem

Existing adaptive optics systems face challenges in accurately and efficiently correcting positional deviations between the phase distribution measured by a wavefront sensor and the compensation phase pattern displayed on a wavefront modulator, particularly due to vibrations and thermal deformations, which affect imaging quality and require time-consuming computation in current methods.

Innovation Solution

A method that involves displaying a singularity generation pattern on the wavefront modulator, measuring the resulting wavefront shape with the sensor, detecting the singularity position, and adjusting the positional deviation to align the measured phase distribution with the compensation pattern, using closed-path integration values to enhance positional accuracy.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the phase measurement method is used to adjust the adaptive optics system, then the corresponding relationship between control signal and measurement signal can be obtained, but the adjustment accuracy depends on phase modulation accuracy, phase measurement accuracy, and optical image accuracy, making it difficult to stably realize high accuracy

Engineering Contradiction:
Improveadjustment accuracyVSAvoidstability of high accuracy
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent introduces a singularity pattern as an intermediary object for adjustment. By displaying a singularity pattern on the wavefront modulator and detecting its position with the wavefront sensor, the system establishes a direct positional correspondence relationship without relying on phase modulation accuracy or phase measurement accuracy. The singularity pattern serves as a mediator that bypasses the inaccurate phase measurement chain, enabling stable high-accuracy adjustment.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Measurement precision

If conventional adjustment methods are used, then the corresponding relationship can be established, but the process requires time-consuming computation and complex procedures

Engineering Contradiction:
Improveadjustment accuracyVSAvoidadjustment time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent extracts the essential adjustment information by using only the position of the singularity pattern rather than the entire phase distribution. This extraction approach simplifies the adjustment process significantly - only the singularity position needs to be detected and matched, eliminating the need for complex phase measurement, calculation, and comparison procedures, thereby reducing adjustment time while maintaining accuracy.

Inventive Principle:
Principle #2Taking out (Extraction)

3Reliability

If the adaptive optics system is adjusted frequently to correct positional deviations caused by vibration and thermal deformation, then imaging quality can be maintained, but the frequent adjustment work increases operation time and complexity

Engineering Contradiction:
Improveimaging qualityVSAvoidoperation simplicity
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

The patent enables the system to perform self-adjustment by automatically detecting the singularity pattern position and correcting positional deviations without requiring complex manual intervention. The simplified adjustment procedure using singularity pattern detection makes it feasible to perform frequent adjustments easily, allowing the system to maintain imaging quality through regular self-correction of positional deviations caused by vibration and thermal deformation.

Inventive Principle:
Principle #25Self-service

Data Source

PatentUS9448120B2Method for adjusting compensating optical system and compensating optical system
Publication Date: 2016.09.20 HAMAMATSU PHOTONICS KK
  • US9448120B2 patent drawing
  • US9448120B2 patent drawing
  • US9448120B2 patent drawing

AI summary

A positional deviation between a phase distribution in a wavefront sensor and a compensation phase pattern in a wavefront modulator is corrected in a short time and with high accuracy by a method including a first step of causing the wavefront modulator to display a singularity generation pattern, a second step of measuring in the sensor an adjustment wavefront shape when an optical image modulated by the singularity generation pattern enters the wavefront sensor, a third step of detecting a position of a singularity in the adjustment wavefront shape from a measurement result in the sensor, and a fourth step of adjusting a positional deviation between a wavefront shape measured in the wavefront sensor and a compensation pattern displayed on the wavefront modulator based on a positional deviation of the position of the singularity.