Single Wavefront Sensor Multi-Field Measurement Device
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Solution Overview
Problem
Existing wavefront measurement devices require multiple expensive imaging elements and Shack-Hartmann sensors for simultaneous calculation of wavefront aberration across multiple visual fields, leading to increased costs and variability in measurement results.
Innovation Solution
A wavefront measurement device that uses a single wavefront sensor to calculate wavefront aberration across multiple visual fields by employing a surface light source, transmission pattern mask, image transfer means, folding plane mirror, wedge prism, and arithmetic device to split and focus light fluxes, allowing for non-overlapping incidence on the sensor and simultaneous measurement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If multiple Shack-Hartmann sensors are arranged for each visual field to simultaneously calculate wavefront aberration, then measurement speed is improved, but device cost increases due to multiple expensive imaging elements
Solution Approach 1:
The patent combines multiple visual field measurements into a single Shack-Hartmann sensor by using a beam splitter to divide the light flux from different visual fields, which are then focused by a lens array onto the same imaging element. This merging approach maintains simultaneous multi-field measurement capability while eliminating the need for multiple expensive sensors, directly resolving the contradiction between measurement speed and device cost
Solution Approach 2:
The patent segments the light flux from different visual fields using a beam splitter into separate optical paths, which are then recombined onto a single sensor. This segmentation allows the system to process multiple visual fields independently through optical separation while using a unified detection platform, achieving both high productivity and cost-effectiveness
2Adaptability or versatility
If multiple Shack-Hartmann sensors are used for simultaneous wavefront measurement across multiple visual fields, then measurement coverage is improved, but measurement precision deteriorates due to characteristic variations between sensors
Solution Approach 1:
The patent makes a single Shack-Hartmann sensor universal for measuring multiple visual fields by using a beam splitter and lens array configuration. Instead of having dedicated sensors for each visual field, one sensor performs multiple measurement functions simultaneously, eliminating characteristic variations between sensors while maintaining comprehensive measurement coverage across all visual fields
Solution Approach 2:
The beam splitter acts as an intermediary that separates light flux from different visual fields without requiring separate sensors for each. This intermediary component enables a single sensor to receive and process signals from multiple visual fields, ensuring measurement precision is not degraded by sensor variations while maintaining broad measurement coverage
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables efficient calculation of wavefront aberration across multiple visual fields with a single sensor, reducing costs and time required for optical system adjustment while maintaining measurement accuracy.
Implementation Method 1
light fluxes corresponding to respective viewing angles at which the wavefront measurement is performed are simultaneously incident on the optical system to be inspected, using the transmission pattern mask
Implementation Method 2
The Shack-Hartmann sensor includes a lens array for splitting and focusing a light flux
Implementation Method 3
an imaging element for imaging focused spots, and calculates wavefront aberration, on the basis of the arrangement of the focused spots imaged by the imaging element
Implementation Method 4
arranged on an optical path of the light flux emitted from the optical system to be inspected
Data Source
Figure 1
Figure 2~3
Figure 4~5B
AI summary
A light source system (26) illuminating an optical system to be inspected (3) and making light fluxes of a plurality of wavefront measurement visual fields be emitted from the optical system to be inspected; a single wavefront sensor (28) calculating wavefront aberration on a basis of measurement of the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected (3); and an optical path optical system (31) are included. The optical path optical system selectively makes the light fluxes of the plurality of wavefront measurement visual fields emitted from the optical system to be inspected (3) be incident on the wavefront sensor (28).