Waveguide Branch Circuit Phase Offset for Plasma Reflected Power

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Solution Overview

Problem

Existing plasma processing apparatuses face challenges in reducing reflected power when electromagnetic waves are branched and introduced to multiple locations, leading to increased power consumption and inefficiency.

Innovation Solution

The electromagnetic wave supply mechanism incorporates a first branch circuit configured as a waveguide, with a first waveguide branching into multiple second waveguides. The lengths of these second waveguides are designed to differ by a specific phase difference, optimizing the distribution of electromagnetic waves and reducing reflected power.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If electromagnetic waves are branched and introduced to multiple locations using conventional waveguide configurations, then the electromagnetic waves can be distributed to multiple processing zones, but reflected power increases leading to power consumption inefficiency

Engineering Contradiction:
Improveelectromagnetic wave distribution capabilityVSAvoidreflected power
Core Design Contradiction:
ProductivityVSLoss of energy

Solution Approach 1:

The patent applies asymmetry by making the waveguide lengths from the branch point to each output end different from one another. Specifically, each waveguide length is designed according to the formula L_i = L_0 + (i-1)×ΔL, where ΔL is a predetermined length difference. This asymmetric configuration prevents standing waves and minimizes reflected power by ensuring that reflected waves from different branches do not constructively interfere, thereby resolving the contradiction between multi-location distribution and reflected power reduction.

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent changes the physical parameter of waveguide length to optimize system performance. By adjusting the length of each waveguide segment according to a specific mathematical relationship (adding incremental length differences), the system transforms the uniform parameter configuration into a non-uniform one that reduces reflected power while maintaining effective electromagnetic wave distribution across multiple locations.

Inventive Principle:
Principle #35Parameter changes

2Loss of energy

If waveguide lengths are made different to reduce reflected power, then energy efficiency improves, but the device complexity and manufacturing precision requirements increase

Engineering Contradiction:
Improvereflected powerVSAvoidwaveguide length precision
Core Design Contradiction:
Loss of energyVSManufacturing precision

Solution Approach 1:

The patent segments the waveguide system into multiple distinct sections with different lengths, where each segment corresponds to a specific branch. By dividing the overall waveguide structure into manageable segments with controlled length differences, the system achieves reflected power reduction while making the manufacturing process more manageable through modular construction approaches.

Inventive Principle:
Principle #1Segmentation

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively reduces reflected power when electromagnetic waves are branched, leading to improved efficiency and reduced power consumption of the radio-frequency power source.

Implementation Method 1

a first branch circuit provided downstream of a radio-frequency power source that generates an electromagnetic wave, the first branch circuit being configured as a waveguide

Methodology Applied
Scientific EffectElectromagnetic wave propagation: Electromagnetic Induction

Implementation Method 2

lengths of the plurality of second waveguides from the branch point to the n output ends differ from each other by m×λ/2+(λ/2)/n

Methodology Applied
Scientific EffectPhase difference: Interference

Data Source

PatentUS20250087463A1Electromagnetic wave supply mechanism and plasma processing apparatus
Publication Date: 2025.03.13 TOKYO ELECTRON LTD
  • US20250087463A1 patent drawing
  • US20250087463A1 patent drawing
  • US20250087463A1 patent drawing

AI summary

An electromagnetic wave supply mechanism for supplying an electromagnetic wave into a processing container serving as a load, includes a first branch circuit provided downstream of a radio-frequency power source for generating the electromagnetic wave. The first branch circuit includes a first waveguide having an input end, a plurality of second waveguides having respective output ends, and a branch point at which the first waveguide is branched into the second waveguides corresponding to n branches. Each output end is connected to the load or an input end of a second branch circuit subsequent to the first branch circuit. In the first branch circuit, when a total number of the output ends seen from the branch point is n, lengths of the second waveguides from the branch point to the n output ends differ from each other by m×λ/2+(λ/2)/n.