Planar Waveguide Flow Cell Patterning for Bottom-Only Nanowell Binding

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Solution Overview

Problem

The fabrication of nanowell substrates in microfluidic devices, such as flow cells, is complicated by issues like over/under polishing and surface damage during the removal of existing surface chemistry in interstitial areas, which current methods struggle to address effectively.

Innovation Solution

A method utilizing planar waveguides to spatially control chemical functionalization within nanowells by directing excitation light only to the bottom region for photoinitiated reactions, eliminating the need for polishing and ensuring target reactants are covalently bound only to the nanowell bottoms, using photoinitiators like camphorquinone-amine systems and azide-alkyne click reactions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If polishing is used to remove existing surface chemistry from interstitial areas, then surface preparation is achieved, but surface damage and fabrication complexity increase

Engineering Contradiction:
Improvesurface preparation qualityVSAvoidsurface damage
Core Design Contradiction:
Manufacturing precisionVSObject-affected harmful factors

Solution Approach 1:

The patent replaces the mechanical polishing process with a photochemical approach. Light is directed through the substrate to selectively photoinitiate polymerization reactions only in the nanowell regions, avoiding mechanical contact and damage to the interstitial surfaces. This substitution of mechanical action with optical-chemical action resolves the contradiction between achieving surface preparation and avoiding surface damage.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention applies local quality by creating different surface properties in different regions. The nanowell regions receive photoinitiated polymerization to create functional surfaces, while the interstitial regions remain untouched. This localized chemical modification achieves the required surface preparation quality without the need for uniform mechanical polishing that causes damage.

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If polishing is used to prepare nanowell surfaces, then surface chemistry is removed, but process complexity and difficulty increase

Engineering Contradiction:
Improvesurface chemistry controlVSAvoidfabrication process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent replaces complex mechanical polishing operations with a simpler photochemical process. By using light to selectively initiate polymerization in nanowell regions, the method eliminates multiple polishing steps, surface inspection steps, and interstitial cleaning steps, thereby reducing overall fabrication process complexity while maintaining precise surface chemistry control.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The invention changes the fundamental parameter of surface modification from mechanical removal to chemical addition. Instead of removing surface chemistry through abrasion, the process introduces polymer material through photoinitiated polymerization. This parameter change simplifies the fabrication process by eliminating the need for controlled removal and subsequent re-deposition steps.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If light is directed to photoinitiate reactions, then chemical functionalization is achieved, but light coupling efficiency must be optimized

Engineering Contradiction:
Improvechemical patterning precisionVSAvoidlight coupling efficiency
Core Design Contradiction:
Manufacturing precisionVSUse of energy by moving object

Solution Approach 1:

The patent utilizes the third dimension by directing light through the substrate from the back side. This dimensional approach allows light to couple efficiently into the nanowell regions without being blocked by surface features or interstitial areas. The light travels through the substrate thickness to reach and photoinitiate reactions only in the intended nanowell regions, optimizing light coupling efficiency while maintaining chemical patterning precision.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables precise chemical patterning of nanometer-scale features in flow cells without surface damage, ensuring reactants are localized to the nanowell bottoms, improving fabrication efficiency and reducing surface interference.

Implementation Method 1

directing light internally within the flow cell such that the light coupling gratings and the first layer of material reflect the light to only the bottom portion of each nanowell

Methodology Applied
Scientific EffectLight reflection: Reflection

Implementation Method 2

introducing a second group of reactants into the nanowells, wherein the second group of reactants includes at least one target reactant, a copper chelated ligand, and a light-sensitive photoinitiator system; and directing light internally within the flow cell such that the light coupling gratings and the first layer of material reflect the light to only the bottom portion of each nanowell for photo-initiating a chemical reaction

Methodology Applied
Scientific EffectPhotoinitiation: Photoionisation

Implementation Method 3

The planar waveguide directs excitation light into only the bottom region of the nanowells where the excitation light photoinitiates a chemical reaction

Methodology Applied
Scientific EffectWaveguide: Waveguide (optics)

Data Source

PatentEP3880356B1System and method for patterning flow cell substrates
Publication Date: 2026.03.25 ILLUMINA INC
  • EP3880356B1 patent drawingFigure 1A~1E
  • EP3880356B1 patent drawingFigure 2A~2B
  • EP3880356B1 patent drawingFigure 3A~3B

AI summary

A method for patterning flow cell substrates using photo-initiated chemical reactions that includes fabricating a planar waveguide flow cell by forming a layer of light coupling gratings on a glass substrate layer; depositing a core layer on the layer of light coupling gratings; depositing a cladding layer on the core layer; and forming nano wells in the cladding layer; silanizing the cladding layer; coating the silanized cladding layer and nano wells with a first group of reactants; introducing a second group of reactants into the nano wells, wherein the second group of reactants includes a target reactant and a light-sensitive photoinitiator system; coupling a light source to the light coupling gratings and directing light internally within the planar waveguide flow cell for photo-initiating a chemical reaction between the first and second groups of reactants, wherein the photo-initiated chemical reaction covalently binds the target reactant to only the bottom portion of each nanowell.