Waveguide Grating Imprint for Depth-Controlled Beam Shaping

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Solution Overview

Problem

Existing methods for forming waveguides with gratings having depth distributions face challenges in achieving precise control over the intensity of beams and viewing angle in augmented reality devices.

Innovation Solution

A method involving the use of a stamp with a positive pattern of depth distribution to imprint a resist material, followed by curing and etching to form gratings with controlled depth distributions, allowing for precise modulation of beam intensity and viewing angle in waveguides.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional methods are used to form waveguide gratings, then the manufacturing process is simpler, but the control over beam intensity and viewing angle is insufficient

Engineering Contradiction:
Improvecontrol over beam intensity and viewing angleVSAvoidfabrication process complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by creating a master stamp with the desired depth distribution pattern before transferring it to the resist material. This master stamp is fabricated with precise depth variations that will subsequently be replicated across the waveguide grating structure, enabling precise control over beam intensity and viewing angle without repeating complex fabrication steps

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent uses copying by creating a master stamp with the exact depth distribution pattern needed, then using this stamp to imprint the resist material multiple times. This allows the complex depth profile to be copied accurately across the entire grating area, achieving precise optical control while simplifying the overall manufacturing process through single-use master template

Inventive Principle:
Principle #26Copying

2Reliability

If uniform depth gratings are formed, then the fabrication process is easier, but the optical performance for augmented reality is limited

Engineering Contradiction:
Improveoptical performance for augmented realityVSAvoiddepth distribution control
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent applies local quality by creating gratings with non-uniform depth distributions where different regions have different depths tailored to specific optical functions. The master stamp contains varying depth profiles that are transferred to the resist, allowing local optimization of beam intensity and viewing angle control in different areas of the waveguide grating

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Enables precise control over beam intensity and increased viewing angle in augmented reality devices by forming gratings with tailored depth distributions, enhancing the virtual reality experience.

Implementation Method 1

imprinting the stamp and curing the resist material forms a patterned resist over the areas

Methodology Applied
Scientific EffectPhotopolymerisation: Photopolymerisation

Data Source

PatentUS20250341677A1Low frequency imprint for grayscale optical device fabrication
Publication Date: 2025.11.06 APPLIED MATERIALS INC
  • US20250341677A1 patent drawing
  • US20250341677A1 patent drawing
  • US20250341677A1 patent drawing

AI summary

Embodiments described herein relate to methods for forming waveguides with gratings of structures having depths distributions, method includes disposing a resist material over areas of a device material or a substrate corresponding to gratings of structures to be formed having depth distributions, imprinting a stamp into the resist material over areas, the stamp having a positive pattern of the depth distribution, the imprinting the stamp and curing the resist material forms a patterned resist over the areas, releasing the stamp, etching the patterned resist and one of the device material or the substrate to form the depth distributions in the device material or the substrate, and forming the structures in the areas having the depth distributions to form the gratings.