Waveguide Grating Coupler Etch Stopper Fluorine Corrosion
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Solution Overview
Problem
Conventional semiconductor device manufacturing processes face challenges with dielectric stack corrosion and reduced service life due to poor resistance against fluorine solutions during wet etching, leading to deformation and penetration issues in grating coupler openings.
Innovation Solution
Incorporating etch stoppers with higher resistance to fluorine solutions than the dielectric stack materials, embedded within the grating coupler teeth, to prevent excessive etching and moisture penetration, and using a method that includes forming dielectric sublayers, recesses, and filling these with resistant materials to create a robust waveguide structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional dielectric stack materials are used in grating coupler teeth, then the manufacturing process is simpler, but the resistance to fluorine solution corrosion is poor leading to deformation and penetration
Solution Approach 1:
The patent applies composite materials by combining dielectric stack materials with etch stopper materials having different corrosion resistance properties. The etch stopper layer is integrated within the grating coupler tooth structure, creating a composite system where the etch stopper provides fluorine solution resistance while the dielectric stack provides optical functionality. This resolves the contradiction by enhancing reliability through material composition rather than structural complexity alone.
Solution Approach 2:
The etch stopper acts as an intermediary protective layer between the fluorine solution and the dielectric stack. This intermediary material specifically resists fluorine corrosion, preventing direct attack on the dielectric stack while allowing the overall structure to maintain its functional integrity. The etch stopper mediates the harmful chemical interaction, protecting the underlying materials without requiring complete structural redesign.
2Duration of action of stationary object
If etch stoppers are embedded in grating coupler teeth to prevent fluorine solution damage, then the service life and reliability are enhanced, but the manufacturing process becomes more complex
Solution Approach 1:
The etch stopper is formed in advance during the manufacturing process, before the final grating coupler tooth structure is completed. By performing the etch stopper formation as a preliminary action integrated into the fabrication sequence, the patent avoids adding complex post-processing steps. The etch stopper is created using standard semiconductor manufacturing techniques, ensuring long service life while maintaining manufacturing feasibility through proactive rather than reactive protection.
3Productivity
If the dielectric stack is exposed to fluorine solution during wet etching, then the etching process can proceed, but the dielectric stack experiences corrosion and deformation
Solution Approach 1:
The patent segments the grating coupler tooth into distinct functional regions: the dielectric stack portion for optical functionality and the etch stopper portion for corrosion protection. This segmentation allows the etching process to proceed efficiently through the etch stopper material while protecting the dielectric stack from direct fluorine exposure. The segmented structure enables simultaneous achievement of productivity and manufacturing precision by isolating the vulnerable dielectric material from the corrosive environment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The etch stoppers effectively prevent fluorine solution damage and moisture penetration, enhancing the service life and reliability of the waveguide structure by maintaining the integrity of the dielectric stack during the etching process.
Implementation Method 1
the etch stopper has a resistance to a fluorine solution that is higher than that of the two sublayers
Data Source
AI summary
The present disclosure provides a waveguide structure including an optical component. The optical component includes a plurality of grating coupler teeth over a semiconductive substrate and a plurality of grating coupler openings between adjacent grating coupler teeth, wherein the grating coupler openings are configured to receive a light wave. Each of the grating coupler teeth includes a dielectric stack and an etch stopper embedded in the dielectric stack, wherein the etch stopper has a resistance to a fluorine solution that is higher than that of the dielectric stack. A method of manufacturing a semiconductor device is also provided.